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Local Manipulation of Skyrmion Nucleation in Microscale Areas of a Thin Film with Nitrogen-Ion Implantation.
Zhao, Yongkang; Wang, Junlin; Xu, Lianxin; Yu, Peiyue; Hou, Mingxuan; Meng, Fei; Xie, Shuai; Meng, Yufei; Zhu, Ronggui; Hou, Zhipeng; Yang, Meiyin; Luo, Jun; Wu, Jing; Xu, Yongbing; Gao, Xingsen; Feng, Chun; Yu, Guanghua.
Affiliation
  • Zhao Y; School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China.
  • Wang J; School of Integrated Circuits, Guangdong University of Technology, Guangzhou 510006, China.
  • Xu L; Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials and Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China.
  • Yu P; Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences (IMECAS), Beijing 100029, China.
  • Hou M; School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China.
  • Meng F; School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China.
  • Xie S; School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China.
  • Meng Y; School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China.
  • Zhu R; School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China.
  • Hou Z; Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials and Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China.
  • Yang M; Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences (IMECAS), Beijing 100029, China.
  • Luo J; Key Laboratory of Microelectronic Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences (IMECAS), Beijing 100029, China.
  • Wu J; School of Integrated Circuits, Guangdong University of Technology, Guangzhou 510006, China.
  • Xu Y; York-Nanjing International Center of Spintronics (YNICS), York University, York YO10 3LT, U.K.
  • Gao X; School of Integrated Circuits, Guangdong University of Technology, Guangzhou 510006, China.
  • Feng C; York-Nanjing International Center of Spintronics (YNICS), York University, York YO10 3LT, U.K.
  • Yu G; Guangdong Provincial Key Laboratory of Quantum Engineering and Quantum Materials and Institute for Advanced Materials, South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, China.
ACS Appl Mater Interfaces ; 2023 Mar 08.
Article de En | MEDLINE | ID: mdl-36888898
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Texte intégral: 1 Collection: 01-internacional Base de données: MEDLINE Langue: En Journal: ACS Appl Mater Interfaces Sujet du journal: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Année: 2023 Type de document: Article Pays d'affiliation: Chine Pays de publication: États-Unis d'Amérique
Texte intégral
Ajouter à My VHL
Imprimer
XML
PubMed Links
Recherche sur Google

Texte intégral: 1 Collection: 01-internacional Base de données: MEDLINE Langue: En Journal: ACS Appl Mater Interfaces Sujet du journal: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Année: 2023 Type de document: Article Pays d'affiliation: Chine Pays de publication: États-Unis d'Amérique