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Localized coherent phonon generation in monolayer MoSe2 from ultrafast exciton trapping at shallow traps.
Bae, Soungmin; Jeong, Tae Young; Raebiger, Hannes; Yee, Ki-Ju; Kim, Yong-Hoon.
Affiliation
  • Bae S; Department of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea. y.h.kim@kaist.ac.kr.
  • Jeong TY; Department of Physics, Yokohama National University, Yokohama, Japan.
  • Raebiger H; Department of Physics, Chungnam National University, Daejeon 34134, Korea. kyee@cnu.ac.kr.
  • Yee KJ; Department of Physics, Yokohama National University, Yokohama, Japan.
  • Kim YH; Department of Physics, Chungnam National University, Daejeon 34134, Korea. kyee@cnu.ac.kr.
Nanoscale Horiz ; 8(9): 1282-1287, 2023 Aug 21.
Article in En | MEDLINE | ID: mdl-37470115
ABSTRACT
We report spectroscopic evidence for the ultrafast trapping of band edge excitons at defects and the subsequent generation of defect-localized coherent phonons (CPs) in monolayer MoSe2. While the photoluminescence measurement provides signals of exciton recombination at both shallow and deep traps, our time-resolved pump-probe spectroscopy on the sub-picosecond time scale detects localized CPs only from the ultrafast exciton trapping at shallow traps. Based on occupation-constrained density functional calculations, we identify the Se vacancy and the oxygen molecule adsorbed on a Se vacancy as the atomistic origins of deep and shallow traps, respectively. Establishing the correlations between the defect-induced ultrafast exciton trapping and the generation of defect-localized CPs, our work could open up new avenues to engineer photoexcited carriers through lattice defects in two-dimensional materials.

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nanoscale Horiz Year: 2023 Document type: Article Publication country: ENGLAND / ESCOCIA / GB / GREAT BRITAIN / INGLATERRA / REINO UNIDO / SCOTLAND / UK / UNITED KINGDOM

Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Nanoscale Horiz Year: 2023 Document type: Article Publication country: ENGLAND / ESCOCIA / GB / GREAT BRITAIN / INGLATERRA / REINO UNIDO / SCOTLAND / UK / UNITED KINGDOM