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Insight into Polishing Slurry and Material Removal Mechanism of Photoassisted Chemical Mechanical Polishing of YAG Crystals.
Zhang, Xiaoyu; Guo, Xingchen; Wang, Haoxiang; Kang, Renke; Gao, Shang.
Affiliation
  • Zhang X; State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China.
  • Guo X; State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China.
  • Wang H; State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China.
  • Kang R; State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China.
  • Gao S; State Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian 116024, China.
Langmuir ; 39(38): 13668-13677, 2023 Sep 26.
Article in En | MEDLINE | ID: mdl-37699563
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Langmuir Journal subject: QUIMICA Year: 2023 Document type: Article Affiliation country: Country of publication:
Fulltext
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Full text: 1 Collection: 01-internacional Database: MEDLINE Language: En Journal: Langmuir Journal subject: QUIMICA Year: 2023 Document type: Article Affiliation country: Country of publication: