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Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold.
Makhotkin, Igor A; Sobierajski, Ryszard; Chalupský, Jaromir; Tiedtke, Kai; de Vries, Gosse; Störmer, Michael; Scholze, Frank; Siewert, Frank; van de Kruijs, Robbert W E; Milov, Igor; Louis, Eric; Jacyna, Iwanna; Jurek, Marek; Klinger, Dorota; Nittler, Laurent; Syryanyy, Yevgen; Juha, Libor; Hájková, Vera; Vozda, Vojtech; Burian, Tomás; Saksl, Karel; Faatz, Bart; Keitel, Barbara; Plönjes, Elke; Schreiber, Siegfried; Toleikis, Sven; Loch, Rolf; Hermann, Martin; Strobel, Sebastian; Nienhuys, Han Kwang; Gwalt, Grzegorz; Mey, Tobias; Enkisch, Hartmut.
Afiliação
  • Makhotkin IA; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Sobierajski R; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Chalupský J; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Tiedtke K; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • de Vries G; ASML Netherlands BV, PO Box 324, Veldhoven, 5500 AH, The Netherlands.
  • Störmer M; Helmholtz-Zentrum Geesthacht, Max-Planck-Strasse 1, Geesthacht 21502, Germany.
  • Scholze F; Physikalisch-Technische Bundesanstalt, Abbestrasse 2-12, Berlin 10587, Germany.
  • Siewert F; Helmholtz Zentrum Berlin für Materialien und Energie, Albert-Einstein-Strasse 15, Berlin 12489, Germany.
  • van de Kruijs RWE; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Milov I; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Louis E; Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Drienerlolaan 5, 7522 NB Enschede, The Netherlands.
  • Jacyna I; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Jurek M; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Klinger D; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Nittler L; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Syryanyy Y; Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL-02-668 Warsaw, Poland.
  • Juha L; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Hájková V; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Vozda V; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Burian T; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Saksl K; Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic.
  • Faatz B; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Keitel B; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Plönjes E; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Schreiber S; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Toleikis S; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Loch R; Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, Hamburg 22607, Germany.
  • Hermann M; Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen 73447, Germany.
  • Strobel S; Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen 73447, Germany.
  • Nienhuys HK; ASML Netherlands BV, PO Box 324, Veldhoven, 5500 AH, The Netherlands.
  • Gwalt G; Helmholtz Zentrum Berlin für Materialien und Energie, Albert-Einstein-Strasse 15, Berlin 12489, Germany.
  • Mey T; Laser-Laboratorium Göttingen eV, Hans-Adolf-Krebs-Weg 1, Göttingen 37077, Germany.
  • Enkisch H; Carl Zeiss SMT GmbH, Rudolf-Eber-Strasse 2, Oberkochen 73447, Germany.
J Synchrotron Radiat ; 25(Pt 1): 77-84, 2018 Jan 01.
Article em En | MEDLINE | ID: mdl-29271755
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Synchrotron Radiat Assunto da revista: RADIOLOGIA Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Holanda País de publicação: Estados Unidos
Texto completo
Adicionar na Minha BVS
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Synchrotron Radiat Assunto da revista: RADIOLOGIA Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Holanda País de publicação: Estados Unidos