Robust and Radiation-Resistant Hofmann-Type Metal-Organic Frameworks for Record Xenon/Krypton Separation.

Pei, Jiyan; Gu, Xiao-Wen; Liang, Cong-Cong; Chen, Banglin; Li, Bin; Qian, Guodong

Pei, Jiyan; Gu, Xiao-Wen; Liang, Cong-Cong; Chen, Banglin; Li, Bin; Qian, Guodong.

Afiliação

Pei J; State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
Gu XW; State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
Liang CC; State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
Chen B; Department of Chemistry, University of Texas at San Antonio, One UTSA Circle, San Antonio, Texas 78249-0698, United States.
Li B; State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.
Qian G; State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China.

J Am Chem Soc ; 144(7): 3200-3209, 2022 02 23.

Article em En | MEDLINE | ID: mdl-35138086

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Am Chem Soc Ano de publicação: 2022 Tipo de documento: Article País de afiliação: China País de publicação: Estados Unidos

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