Enhanced Photocatalytic Performance under Ultraviolet and Visible Light Illumination of ZnO Thin Films Prepared by Modified Sol-Gel Method.

Semiconductor oxides are frequently used as active photocatalysts for the degradation of organic agents in water polluted by domestic industry. In this study, sol-gel ZnO thin films with a grain size in the range of 7.5-15.7 nm were prepared by applying a novel two-step drying procedure involving hot air treatment at 90-95 °C followed by conventional furnace drying at 140 °C. For comparison, layers were made by standard furnace drying. The effect of hot air treatment on the film surface morphology, transparency, and photocatalytic behavior during the degradation of Malachite Green azo dye in water under ultraviolet or visible light illumination is explored. The films treated with hot air demonstrate significantly better photocatalytic activity under ultraviolet irradiation than the furnace-dried films, which is comparable with the activity of unmodified ZnO nanocrystal powders. The achieved percentage of degradation is 78-82% under ultraviolet illumination and 85-90% under visible light illumination. Multiple usages of the hot air-treated films (up to six photocatalytic cycles) are demonstrated, indicating improved photo-corrosion resistance. The observed high photocatalytic activity and good photo-corrosion stability are related to the hot air treatment, which causes a reduction of oxygen vacancies and other defects and the formation of interstitial oxygen and/or zinc vacancies in the films.

UV Sensitivity of MOS Structures with Silicon Nanoclusters.

Selective UV sensitivity was observed in Metal-Oxide-Semiconductor structures with Si nanoclusters. Si nanocrystals and amorphous Si nanoparticles (a-Si NPs) were obtained by furnace annealing of SiOx films with x = 1.15 for 60 min in N2 at 1000 and 700 °C, respectively. XPS and TEM analysis prove phase separation and formation of Si nanocrystals in SiO2, while the a-Si NPs are formed in SiO1.7 matrix. Both types of structures show selective sensitivity to UV light; the effect is more pronounced in the structure with nanocrystals. The responsivity of the nanocrystal structure to 365 nm UV light is ~ 4 times higher than that to green light at 4 V applied to the top contact. The observed effect is explained by assuming that only short wavelength radiation generates photocarriers in the amorphous and crystalline nanoclusters.