Modelling second harmonic generation at mid-infrared frequencies in waveguide integrated Ge/SiGe quantum wells.

A promising alternative to bulk materials for the nonlinear coupling of optical fields is provided by photonic integrated circuits based on heterostructures made of asymmetric-coupled quantum wells. These devices achieve a huge nonlinear susceptivity but are affected by strong absorption. Here, driven by the technological relevance of the SiGe material system, we focus on Second-Harmonic Generation in the mid-infrared spectral region, realized by means of Ge-rich waveguides hosting p-type Ge/SiGe asymmetric coupled quantum wells. We present a theoretical investigation of the generation efficiency in terms of phase mismatch effects and trade-off between nonlinear coupling and absorption. To maximize the SHG efficiency at feasible propagation distances, we also individuate the optimal density of quantum wells. Our results indicate that conversion efficiencies of ≈ 0.6%/W can be achieved in WGs featuring lengths of few hundreds µm only.

1†GHz electro-optical silicon-germanium modulator in the 5-9 µm wavelength range.

Spectroscopy in the mid-infrared (mid-IR) wavelength range is a key technique to detect and identify chemical and biological substances. In this context, the development of integrated optics systems paves the way for the realization of compact and cost-effective sensing systems. Among the required devices, an integrated electro-optical modulator (EOM) is a key element for advanced sensing circuits exploiting dual comb spectroscopy. In this paper, we have experimentally demonstrated an integrated EOM operating in a wide wavelength range, i.e. from 5 to 9 µm at radio frequency (RF) as high as 1 GHz. The modulator exploits the variation of free carrier absorption in a Schottky diode embedded in a graded silicon germanium (SiGe) photonic waveguide.

Engineering of the spin on dopant process on silicon on insulator substrate.

We report on a systematic analysis of phosphorus diffusion in silicon on insulator thin film via spin-on-dopant process (SOD). This method is used to provide an impurity source for semiconductor junction fabrication. The dopant is first spread into the substrate via SOD and then diffused by a rapid thermal annealing process. The dopant concentration and electron mobility were characterized at room and low temperature by four-probe and Hall bar electrical measurements. Time-of-flight-secondary ion mass spectroscopy was performed to estimate the diffusion profile of phosphorus for different annealing treatments. We find that a high phosphorous concentration (greater than 1020 atoms cm-3) with a limited diffusion of other chemical species and allowing to tune the electrical properties via annealing at high temperature for short time. The ease of implementation of the process, the low cost of the technique, the possibility to dope selectively and the uniform doping manufactured with statistical process control show that the methodology applied is very promising as an alternative to the conventional doping methods for the implementation of optoelectronic devices.

Characterization of integrated waveguides by atomic-force-microscopy-assisted mid-infrared imaging and spectroscopy.

A novel spectroscopy technique to enable the rapid characterization of discrete mid-infrared integrated photonic waveguides is demonstrated. The technique utilizes lithography patterned polymer blocks that absorb light strongly within the molecular fingerprint region. These act as integrated waveguide detectors when combined with an atomic force microscope that measures the photothermal expansion when infrared light is guided to the block. As a proof of concept, the technique is used to experimentally characterize propagation loss and grating coupler response of Ge-on-Si waveguides at wavelengths from 6 to 10 µm. In addition, when the microscope is operated in scanning mode at fixed wavelength, the guided mode exiting the output facet is imaged with a lateral resolution better than 500 nm i.e. below the diffraction limit. The characterization technique can be applied to any mid-infrared waveguide platform and can provide non-destructive in-situ testing of discrete waveguide components.

Ge-rich graded SiGe waveguides and interferometers from 5 to 11†µm wavelength range.

The mid-infrared (mid-IR) wavelength range hosts unique vibrational and rotational resonances of a broad variety of substances that can be used to unambiguously detect the molecular composition in a non-intrusive way. Mid-IR photonic-integrated circuits (PICs) are thus expected to have a major impact in many applications. Still, new challenges are posed by the large spectral width required to simultaneously identify many substances using the same photonic circuit. Ge-rich graded SiGe waveguides have been proposed as a broadband platform approach for mid-IR PICs. In this work, ultra-broadband waveguides are experimentally demonstrated within unprecedented wavelength range, efficiently guiding light from 5 to 11 µm. Interestingly, losses from 0.5 to 1.2 dB/cm are obtained between 5.1 and 8 µm wavelength, and values below 3 dB/cm are measured from 9.5 to 11.2 µm wavelength. An increase of propagation losses is seen between 8 and 9.5 µm; however, values stay below 4.6 dB/cm in the entire wavelength range. A detailed analysis of propagation losses is reported, supported by secondary ion mass spectrometry measurement, and different contributions are analyzed: silicon substrate absorption, oxygen impurities, free carrier absorption by residual doping, sidewall roughness and multiphonon absorption. Finally, Mach-Zehnder interferometers are characterized, and wideband operation is experimentally obtained from 5.5 to 10.5 µm wavelength.

SiGe quantum well infrared photodetectors on strained-silicon-on-insulator.

We demonstrate p-type SiGe quantum well infrared photodetectors (QWIPs) on a strained-silicon-on-insulator (sSOI) substrate. The sSOI system allows strain-balancing between the QWIP heterostructure with an average composition of Si0.7Ge0.3 and the substrate, and therefore lifts restrictions to the active material thickness faced by SiGe growth on silicon or silicon-on-insulator substrates. The realized sSOI QWIPs feature a responsivity peak at detection wavelengths around 6 µm, based on a transition between heavy-hole states. The fabricated devices have been thoroughly characterized and compared to equivalent material simultaneously grown on virtual Si0.7Ge0.3 substrates based on graded SiGe buffers. Responsivities of up to 3.6 mA/W are achieved by the sSOI QWIPs at 77 K, demonstrating the large potential of sSOI-based devices as components for a group-IV optoelectronic platform in the mid-infrared spectral region.

Broadband integrated racetrack ring resonators for long-wave infrared photonics.

Long-wave infrared photonics is an exciting research field meant to revolutionize our daily life by means of key advances in several domains including communications, imaging systems, medical care, environmental monitoring, or multispectral chemical sensing, among others. For this purpose, integrated photonics is particularly promising owing to its compactness, mass fabrication, and energy-efficient characteristics. We present in this Letter, for the first time to the best of our knowledge, broadband integrated racetrack ring resonators operating within the crucial molecular fingerprint region. Devices show an operation bandwidth of Δλ≈900 nm with a central wavelength of λ≈8 µm, a quality factor of Q≈3200, and an extinction ratio of ER≈10 dB around the critical coupling condition. These resonant structures establish the basis of a new generation of integrated building blocks for long-wave infrared photonics that opens the route towards miniaturized multitarget molecule detection systems.

Modeling of second harmonic generation in hole-doped silicon-germanium quantum wells for mid-infrared sensing.

The development of Ge and SiGe chemical vapor deposition techniques on silicon wafers has enabled the integration of multi-quantum well structures in silicon photonics chips for nonlinear optics with potential applications to integrated nonlinear optics, however research has focused up to now on undoped quantum wells and interband optical excitations. In this work, we present model calculations for the giant nonlinear coefficients provided by intersubband transitions in hole-doped Ge/SiGe and Si/SiGe multi-quantum wells. We employ a valence band-structure model for Si1-xGex to calculate the confined hole states of asymmetric-coupled quantum wells for second-harmonic generation in the mid-infrared. We calculate the nonlinear emission spectra from the second-order susceptibility tensor, including the particular vertical emission spectra of valence-band quantum wells. Two possible nonlinear mid-infrared sensor architectures, one based on waveguides and another based on metasurfaces, are described as perspective application.

On-chip Bragg grating waveguides and Fabry-Perot resonators for long-wave infrared operation up to 8.4 µm.

Taking advantage of unique molecular absorption lines in the mid-infrared fingerprint region and of the atmosphere transparency window (3-5 µm and 8-14 µm), mid-infrared silicon photonics has attracted more research activities with a great potential for applications in different areas, including spectroscopy, remote sensing, free-space communication and many others. However, the demonstration of resonant structures operating at long-wave infrared wavelengths still remains challenging. Here, we demonstrate Bragg grating-based Fabry-Perot resonators based on Ge-rich SiGe waveguides with broadband operation in the mid-infrared. Bragg grating waveguides are investigated first at different wavelengths from 5.4 µm up to 8.4 µm, showing a rejection band up to 21 dB. Integrated Fabry-Perot resonators are then demonstrated for the first time in the 8 µm-wavelength range, showing Q-factors as high as 2200. This first demonstration of integrated mid-infrared Fabry-Perot resonators paves the way towards resonance-enhanced sensing circuits and non-linear based devices at these wavelengths.

Integrated broadband dual-polarization Ge-rich SiGe mid-infrared Fourier-transform spectrometer.

Miniaturized on-chip spectrometers covering a wide band of the mid-infrared spectrum have an immense potential for multi-target detection in high-impact applications, such as chemical sensing or environmental monitoring. Specifically, multi-aperture spatial heterodyne Fourier-transform spectrometers (SHFTS) provide high throughput and improved tolerance against fabrication errors, compared to conventional counterparts. Still, state-of-the-art implementations have only shown single-polarization operation in narrow bandwidths within the near and short infrared. Here, we demonstrate the first, to the best of our knowledge, dual-polarization ultra-wideband SHFTS working beyond 5 µm wavelength. We exploit the unique flexibility in material engineering of the graded-index germanium-rich silicon-germanium (Ge-rich SiGe) photonic platform to implement a SHFTS that can be operated in an unprecedented range of 800 cm-1, showing experimental resolution better than 15 cm-1 for both orthogonal polarizations and free spectral range of 132 cm-1, in the wavelength range between 5 and 8.5 µm.