Detalhe da pesquisa
1.
Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a ballistic transport-reaction model.
Phys Chem Chem Phys
; 25(34): 22952-22964, 2023 Aug 30.
Artigo
em Inglês
| MEDLINE | ID: mdl-37593799
2.
Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile.
Phys Chem Chem Phys
; 24(15): 8645-8660, 2022 Apr 13.
Artigo
em Inglês
| MEDLINE | ID: mdl-35353098
3.
Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst.
Phys Chem Chem Phys
; 24(34): 20506-20516, 2022 Aug 31.
Artigo
em Inglês
| MEDLINE | ID: mdl-35993759
4.
Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels.
Phys Chem Chem Phys
; 22(40): 23107-23120, 2020 Oct 21.
Artigo
em Inglês
| MEDLINE | ID: mdl-33025987