Accelerating Flux Calculations Using Sparse Sampling.

The ongoing miniaturization in electronics poses various challenges in the designing of modern devices and also in the development and optimization of the corresponding fabrication processes. Computer simulations offer a cost- and time-saving possibility to investigate and optimize these fabrication processes. However, modern device designs require complex three-dimensional shapes, which significantly increases the computational complexity. For instance, in high-resolution topography simulations of etching and deposition, the evaluation of the particle flux on the substrate surface has to be re-evaluated in each timestep. This re-evaluation dominates the overall runtime of a simulation. To overcome this bottleneck, we introduce a method to enhance the performance of the re-evaluation step by calculating the particle flux only on a subset of the surface elements. This subset is selected using an advanced multi-material iterative partitioning scheme, taking local flux differences as well as geometrical variations into account. We show the applicability of our approach using an etching simulation of a dielectric layer embedded in a multi-material stack. We obtain speedups ranging from 1.8 to 8.0, with surface deviations being below two grid cells (0.6⁻3% of the size of the etched feature) for all tested configurations, both underlining the feasibility of our approach.

Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review.

Semiconductor device dimensions have been decreasing steadily over the past several decades, generating the need to overcome fundamental limitations of both the materials they are made of and the fabrication techniques used to build them. Modern metal gates are no longer a simple polysilicon layer, but rather consist of a stack of several different materials, often requiring multiple processing steps each, to obtain the characteristics needed for stable operation. In order to better understand the underlying mechanics and predict the potential of new methods and materials, technology computer aided design has become increasingly important. This review will discuss the fundamental methods, used to describe expected topology changes, and their respective benefits and limitations. In particular, common techniques used for effective modeling of the transport of molecular entities using numerical particle ray tracing in the feature scale region will be reviewed, taking into account the limitations they impose on chemical modeling. The modeling of surface chemistries and recent advances therein, which have enabled the identification of dominant etch mechanisms and the development of sophisticated chemical models, is further presented. Finally, recent advances in the modeling of gate stack pattering using advanced geometries in the feature scale are discussed, taking note of the underlying methods and their limitations, which still need to be overcome and are actively investigated.

New insight into the shortening of the collagen fibril D-period in human cornea.

Collagen fibrils type I display a typical banding pattern, so-called D-periodicity, of about 67 nm, when visualized by atomic force or electron microscopy imaging. Herein we report on a significant shortening of the D-period for human corneal collagen fibrils type I (21 ± 4 nm) upon air-drying, whereas no changes in the D-period were observed for human scleral collagen fibrils type I (64 ± 4 nm) measured under the same experimental conditions as the cornea. It was also found that for the corneal stroma fixed with glutaraldehyde and air-dried, the collagen fibrils show the commonly accepted D-period of 61 ± 8 nm. We used the atomic force microscopy method to image collagen fibrils type I present in the middle layers of human cornea and sclera. The water content in the cornea and sclera samples was varying in the range of .066-.085. Calculations of the D-period using the theoretical model of the fibril and the FFT approach allowed to reveal the possible molecular mechanism of the D-period shortening in the corneal collagen fibrils upon drying. It was found that both the decrease in the shift and the simultaneous reduction in the distance between tropocollagen molecules can be responsible for the experimentally observed effect. We also hypothesize that collagen type V, which co-assembles with collagen type I into heterotypic fibrils in cornea, could be involved in the observed shortening of the corneal D-period.