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Crossing the insulator-to-metal barrier with a thiazyl radical conductor.
Mailman, Aaron; Winter, Stephen M; Yu, Xin; Robertson, Craig M; Yong, Wenjun; Tse, John S; Secco, Richard A; Liu, Zhenxian; Dube, Paul A; Howard, Judith A K; Oakley, Richard T.
Afiliação
  • Mailman A; Department of Chemistry, University of Waterloo, Waterloo, Ontario N2L 3G1, Canada.
J Am Chem Soc ; 134(24): 9886-9, 2012 Jun 20.
Article em En | MEDLINE | ID: mdl-22681388
ABSTRACT
The layered-sheet architecture of the crystal structure of the fluoro-substituted oxobenzene-bridged bisdithiazolyl radical FBBO affords a 2D π-electronic structure with a large calculated bandwidth. The material displays high electrical conductivity for a f = 1/2 system, with σ(300 K) = 2 × 10(-2) S cm(-1). While the conductivity is thermally activated at ambient pressure, with E(act) = 0.10 eV at 300 K, indicative of a Mott insulating state, E(act) is eliminated at 3 GPa, suggesting the formation of a metallic state. The onset of metallization is supported by infrared measurements, which show closure of the Mott-Hubbard gap above 3 GPa.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2012 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2012 Tipo de documento: Article