Rapid and Low-Temperature Molecular Precursor Approach toward Ternary Layered Metal Chalcogenides and Oxides: Mo1-x W x S2 and Mo1-x W x O3 Alloys (0 &#8804; x &#8804; 1).

Zeng, Niting; Wang, Yi-Chi; Neilson, Joseph; Fairclough, Simon M; Zou, Yichao; Thomas, Andrew G; Cernik, Robert J; Haigh, Sarah J; Lewis, David J

Rapid and Low-Temperature Molecular Precursor Approach toward Ternary Layered Metal Chalcogenides and Oxides: Mo_1-x W _x S₂ and Mo_1-x W _x O₃ Alloys (0 ≤ x ≤ 1).

Zeng, Niting; Wang, Yi-Chi; Neilson, Joseph; Fairclough, Simon M; Zou, Yichao; Thomas, Andrew G; Cernik, Robert J; Haigh, Sarah J; Lewis, David J.

Afiliação

Zeng N; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Wang YC; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Neilson J; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Fairclough SM; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Zou Y; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Thomas AG; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Cernik RJ; Photon Science Institute, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Haigh SJ; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.
Lewis DJ; Department of Materials, University of Manchester, Oxford Road, Manchester M13 9PL, U.K.

Chem Mater ; 32(18): 7895-7907, 2020 Sep 22.

Article em En | MEDLINE | ID: mdl-32982044

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article