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Ultrashort-distance optical interconnects are becoming increasingly important due to continuous improvements in servers and high-performance computers. As light sources in such interconnects, directly modulated semiconductor lasers with an ultrasmall active region are promising. In addition, using Si waveguides is important to provide low loss optical links with functions such as wavelength filtering and switching. In this paper, we demonstrate a wafer-scale heterogeneous integration of lambda-scale embedded active-region photonic-crystal (LEAP) lasers and Si waveguides, achieved through precise alignment. We numerically and experimentally demonstrated the coupling design between the LEAP lasers and Si waveguides; it is important to match propagation constants of Si waveguides and wavenumber of the optical cavity modes. The LEAP lasers exhibit an ultralow threshold current of 13.2-µA and 10-Gbit/s direct modulation. We also achieved the first data transmission using an optical link consisting of a LEAP laser, Si waveguide, and photodetector and obtained an averaged eye diagram at a bit rate of 10 Gbit/s with a bias current of 150 µA.
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We evaluate the nonlinear coefficient of graphene-on-silicon waveguides through the coincidence measurement of photon-pairs generated via spontaneous four-wave mixing. We observed the temporal correlation of the photon-pairs from the waveguides over various transfer layouts of graphene sheets. A simple analysis of the experimental results using coupled-wave equations revealed that the atomically-thin graphene sheets enhanced the nonlinearity of silicon waveguides up to ten-fold. The results indicate that the purely χ (3)-based effective nonlinear refractive index of graphene is on the order of 10-13 m 2/W, and provide important insights for applications of graphene-based nonlinear optics in on-chip nanophotonics.
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Toward the realization of low-cost, long-, and extended-reach 400GbE data-center applications, the performance of pulse amplitude modulated (PAM) signals is studied using a state-of-the-art, high-performance 1.3-µm distributed feedback directly modulated laser, without any optical amplification or complex digital processing. Amplifierless PAM-4 transmissions of up to 64-Gb/s are achieved over 40 km of standard single-mode fiber (SSMF) for standard KP4-FEC, while 84-Gb/s PAM-8 signals are evaluated over 10 km SSMF.
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We demonstrate 20-µm-long twin-mirror membrane distributed-reflector (DR) lasers for chip-to-chip optical interconnects. The lasers employ distributed Bragg reflectors (DBRs) at both ends of a 20-µm-long λ/4-phase shifted distributed feedback (DFB) section. We achieve single-mode lasing in a λ/4-phase shifted DFB mode at room temperature with a threshold current of 0.39 mA. The lasing wavelength remains stable while the injected current is varied, and it is determined by the λ/4 phase-shifted DFB. The modulation current efficiency is 11.4 GHz/mA1/2, which is measured by using relative intensity noise spectra. We also demonstrate the direct modulation of the DR lasers at a bit rate of 25.8 Gbit/s with an energy cost of 163 fJ/bit.
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Environmental sustainability information in the manufacturing industry is not easily shared between stages in the product lifecycle. In particular, reliable manufacturing-related information for assessing the sustainability of a product is often unavailable at the design stage. Instead, designers rely on aggregated, often outdated information or make decisions by analogy (e.g., a similar manufacturing process for a similar product yielded X and Y results). However, smart manufacturing and the Internet of Things have potential to bridge the gap between design and manufacturing through data and knowledge sharing. This paper analyzes environmental sustainability assessment methods to enable more accurate decisions earlier in design. The techniques and methods are categorized based on the stage they apply to in the product lifecycle, as described by the Systems Integration of Manufacturing Applications (SIMA) reference architecture. Furthermore, opportunities for aligning standard data representation to promote sustainability assessment during design are identified.
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We demonstrate monolithic integration of a 50-µm-long-cavity membrane distributed-reflector laser with a spot-size converter, consisting of a tapered InP wire waveguide and an SiOx waveguide, on SiO2/Si substrate. The device exhibits 9.4-GHz/mA0.5 modulation efficiency with a 2.2-dB fiber coupling loss. We demonstrate 25.8-Gbit/s direct modulation with a bias current of 2.5 mA, resulting in a low energy cost of 132 fJ/bit.
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We demonstrate the generation and demultiplexing of quantum correlated photons on a monolithic photonic chip composed of silicon and silica-based waveguides. Photon pairs generated in a nonlinear silicon waveguide are successfully separated into two optical channels of an arrayed-waveguide grating fabricated on a silica-based waveguide platform.
Asunto(s)
Luz , Dispositivos Ópticos , Refractometría/instrumentación , Dispersión de Radiación , Dióxido de Silicio/química , Silicio/química , Resonancia por Plasmón de Superficie/instrumentación , Cristalización , Diseño de Equipo , FotonesRESUMEN
We present a compact and stable terahertz (THz) vector spectroscopy system using silicon photonics technology. A silicon-based integrated phase control circuit greatly reduces the physical size of the continuous-wave THz spectroscopy system and enhances environmental phase stability. Differential lightwave phase control using two carrier-injection electro-optic modulators enables fast and linear phase sweeps of THz-waves. Using the silicon-photonic circuit, we demonstrate a THz vector spectrometer; the dynamic ranges are 65 and 35 dB at 300 GHz and 1 THz with 1-ms integration time and phase variation is less than ± 10° without thermal packaging.
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By way of a brief review of Si photonics technology, we show that significant improvements in device performance are necessary for practical telecommunications applications. In order to improve device performance in Si photonics, we have developed a Si-Ge-silica monolithic integration platform, on which compact Si-Ge-based modulators/detectors and silica-based high-performance wavelength filters are monolithically integrated. The platform features low-temperature silica film deposition, which cannot damage Si-Ge-based active devices. Using this platform, we have developed various integrated photonic devices for broadband telecommunications applications.
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We experimentally demonstrate a high-quality phase shift keying demodulator based on a silicon photonic wire waveguide. Since the birefringence of the waveguide generates extremely huge differential group delay, an ultra-compact and high-extinction-ratio delay line interferometer is devised in TE and TM modes. We firstly calculated and simulated the requirements for propagation length and waveguide's dimensions. Then, we measured the interference spectrum, eye pattern, bit error rate, and temperature dependence to ascertain its feasibility for DPSK demodulation. For a 2.8 cm-long wire waveguide, a free spectral range of 9.6 GHz and an error-free DPSK demodulation around 10 Gb/s are obtained.
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On the silicon (Si) photonic platform, we monolithically integrated a silica-based arrayed-waveguide grating (AWG) and germanium (Ge) photodiodes (PDs) using low-temperature fabrication technology. We confirmed demultiplexing by the AWG, optical-electrical signal conversion by Ge PDs, and high-speed signal detection at all channels. In addition, we mounted a multichannel transimpedance amplifier/limiting amplifier (TIA/LA) circuit on the fabricated AWG-PD device using flip-chip bonding technology. The results show the promising potential of our Si photonic platform as a photonics-electronics convergence.
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We demonstrate a monolithic integration of variable optical attenuators (VOAs) and photodetectors (PDs) based on submicrometer silicon (Si) rib waveguide with p-i-n diode structure for near infrared (NIR) light. To make the Si PD absorptive for NIR, we introduced lattice defects at the rib core by means of argon ion implantation. At reverse bias of 5 V, the PD exhibits dark current of approximately 1 nA, responsivity of approximately 65 mA/W at 1560-nm wavelength, and a 3-dB cut-off frequency of approximately 350 MHz, while the VOA shows approximately 100 MHz. The PD has an absorption coefficient as low as approximately 0.5 cm(-1), which is favorable for an in in-line PD configuration, where the PD absorbs a small portion of the optical power. For DC light, the PD precisely detects the optical power attenuated by the VOA with a detection range of over 40 dB. The 3-dB cut-off frequency of synchronous operation between the VOA and PD is approximately 50 MHz, which is limited by RF noise originating from the VOA drive current. Putting an isolation groove between the VOA and PD is effective for avoiding performance degradation in DC and RF operation.
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We demonstrate the monolithic integration of germanium (Ge) p-i-n photodetector (PDs) with silicon (Si) variable optical attenuator (VOAs) based on submicrometer Si rib waveguide. A PD is connected to a VOA along the waveguide via a tap coupler. The PDs exhibit low dark current of ~60 nA and large responsivity of ~0.8 A/W at the reverse bias of 1 V at room temperature. These characteristics are uniform over the chip scale. The PDs generate photocurrents precisely with respect to DC optical power attenuated by the VOAs. Two devices work synchronously for modulated optical signals as well. 3-dB cut-off frequency of the VOA is ~100 MHz, while that of the PD is ~1 GHz. The synchronous response speed is limited by the VOA response speed. This is the first demonstration, to the best of our knowledge, of monolithic integration of Ge PDs with high-carrier-injection-based optical modulation devices based on Si.
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We investigated influence of carrier lifetime on performance of silicon (Si) p-i-n variable optical attenuators (VOAs) on submicrometer Si rib waveguides. VOAs were fabricated with and without intentional implantation of lattice defects into their intrinsic region. Carrier lifetime was measured by pulse responses for normal incidence of picosecond laser pulse of 775 nm to the VOA, as approximately 1 ns and approximately 7 ns for the VOAs with and without defects, respectively. Carrier lifetime is determined by the sum of surface recombination and Auger recombination for VOAs without defects, while Schockley-Read-Hall recombination is dominant for the VOA with defects. As a result, attenuation efficiency (dB/mA) is 0.2-0.7 and 0.04-0.1, while 3-dB bandwidth is 40-100 MHz and over 200 MHz for the VOAs with and without defects, respectively. There is a trade-off relation between attenuation and response speed of the VOAs with respect to carrier lifetime i.e., attenuation efficiency is linearly proportional to the carrier lifetime, whereas response speed is inversely proportional to it.