1.
Rev Sci Instrum
; 79(6): 063301, 2008 Jun.
Artigo
em Inglês
| MEDLINE
| ID: mdl-18601399
RESUMO
We report on the development of a beam line for mass-selected metal and semiconductor clusters. The cluster source combines the principles of plasma sputtering and gas condensation. Both techniques together allow to produce clusters in a wide size range. With the aid of a time-of-flight system, small clusters (i.e., Cu(n)(+), n<100) are selected and pure beams containing only one cluster size are provided. For large clusters (containing several thousands of atoms), a beam with a narrow size distribution is obtained. A 90 degrees quadrupole deviator is used to separate charged clusters from neutral ones.