High-temperature continuous-wave operation of directly grown InAs/GaAs quantum dot lasers on on-axis Si (001).

Laser devices for silicon photonics are expected to be implemented in an integrated environment to complement CMOS devices. For this reason, quantum dot (QD) lasers with excellent thermal properties have been considered as strong candidates for Si photonics light sources. The direct growth of QD lasers on Si (001) on-axis substrates has been garnering attention owing to the possibility of monolithic integration on a CMOS-compatible wafer. In this paper, we report on the high-temperature (over 100°C) continuous-wave operation of an InAs/GaAs QD laser directly grown on on-axis Si (001) substrates through the use of only molecular beam epitaxy.

All MBE grown InAs/GaAs quantum dot lasers on on-axis Si (001).

Directly grown III-V quantum dot (QD) laser on on-axis Si (001) is a good candidate for achieving monolithically integrated Si photonics light source. Nowadays, laser structures containing high quality InAs / GaAs QD are generally grown by molecular beam epitaxy (MBE). However, the buffer layer between the on-axis Si (001) substrate and the laser structure are usually grown by metal-organic chemical vapor deposition (MOCVD). In this paper, we demonstrate all MBE grown high-quality InAs/GaAs QD lasers on on-axis Si (001) substrates without using patterning and intermediate layers of foreign material.