Detalhe da pesquisa
1.
Self-Formation of a Ru/ZnO Multifunctional Bilayer for the Next-Generation Interconnect Technology via Area-Selective Atomic Layer Deposition.
Small
; 19(34): e2300290, 2023 Aug.
Artigo
Inglês
| MEDLINE | ID: mdl-37127866
2.
Tailored Self-Assembled Monolayer using Chemical Coupling for Indium-Gallium-Zinc Oxide Thin-Film Transistors: Multifunctional Copper Diffusion Barrier.
ACS Appl Mater Interfaces
; 14(50): 56310-56320, 2022 Dec 21.
Artigo
Inglês
| MEDLINE | ID: mdl-36461928