Mechanically-Durable Antireflective Subwavelength Nanoholes on Glass Surfaces Using Lithography-Free Fabrication.

Traditional multilayer antireflection (AR) surfaces are of significant importance for numerous applications, such as laser optics, camera lenses, and eyeglasses. Recently, technological advances in the fabrication of biomimetic AR surfaces capable of delivering broadband omnidirectional high transparency combined with self-cleaning properties have opened an alternative route toward realization of multifunctional surfaces which would be beneficial for touchscreen displays or solar harvesting devices. However, achieving the desired surface properties often requires sophisticated lithography fabrication methods consisting of multiple steps. In the present work, we show the design and implementation of mechanically robust AR surfaces fabricated by a lithography-free process using thermally dewetted silver as an etching mask. Both-sided nanohole (NH) surfaces exhibit transmittance above 99% in the visible or the near-infrared ranges combined with improved angular response at an angle of incidence of up to θi = 60°. Additionally, the NHs demonstrate excellent mechanical resilience against repeated abrasion with cheesecloth due to favorable redistribution of the shearing mechanical forces, making them a viable option for touchscreen display applications.

Multispectral Holographic Intensity and Phase Imaging of Semitransparent Ultrathin Films.

In this paper, we demonstrate a novel optical characterization method for ultrathin semitransparent and absorbing materials through multispectral intensity and phase imaging. The method is based on a lateral-shearing interferometric microscopy (LIM) technique, where phase-shifting allows extraction of both the intensity and the phase of transmitted optical fields. To demonstrate the performance in characterizing semitransparent thin films, we fabricated and measured cupric oxide (CuO) seeded gold ultrathin metal films (UTMFs) with mass-equivalent thicknesses from 2 to 27 nm on fused silica substrates. The optical properties were modeled using multilayer thin film interference and a parametric model of their complex refractive indices. The UTMF samples were imaged in the spectral range from 475 to 750 nm using the proposed LIM technique, and the model parameters were fitted to the measured data in order to determine the respective complex refractive indices for varying thicknesses. Overall, by using the combined intensity and phase not only for imaging and quality control but also for determining the material properties, such as complex refractive indices, this technique demonstrates a high potential for the characterization of the optical properties, of (semi-) transparent thin films.