Ge-on-Si and Ge-on-SOI thermo-optic phase shifters for the mid-infrared.

Germanium-on-silicon thermo-optic phase shifters are demonstrated in the 5 µm wavelength range. Basic phase shifters require 700 mW of power for a 2π phase shift. The required power is brought down to 80 mW by complete undercut using focused ion beam. Finally an efficient thermo-optic phase shifter is demonstrated on the germanium on SOI platform. A tuning power (for a 2π phase shift) of 105 mW is achieved for a Ge-on-SOI structure which is lowered to 16 mW for a free standing phase shifter.

Density and Capture Cross-Section of Interface Traps in GeSnO2 and GeO2 Grown on Heteroepitaxial GeSn.

An imperative factor in adapting GeSn as the channel material in CMOS technology, is the gate-oxide stack. The performance of GeSn transistors is degraded due to the high density of traps at the oxide-semiconductor interface. Several oxide-gate stacks have been pursued, and a midgap Dit obtained using the ac conductance method, is found in literature. However, a detailed signature of oxide traps like capture cross-section, donor/acceptor behavior and profile in the bandgap, is not yet available. We investigate the transition region between stoichiometric insulators and strained GeSn epitaxially grown on virtual Ge substrates. Al2O3 is used as high-κ oxide and either Ge1-xSnxO2 or GeO2 as interfacial layer oxide. The interface trap density (Dit) profile in the lower half of the bandgap is measured using deep level transient spectroscopy, and the importance of this technique for small bandgap materials like GeSn, is explained. Our results provide evidence for two conclusions. First, an interface traps density of 1.7 × 10(13) cm(-2)eV(-1) close to the valence band edge (Ev + 0.024 eV) and a capture cross-section (σp) of 1.7 × 10(-18) cm(2) is revealed for GeSnO2. These traps are associated with donor states. Second, it is shown that interfacial layer passivation of GeSn using GeO2 reduces the Dit by 1 order of magnitude (2.6 × 10(12) cm(-2)eV(-1)), in comparison to GeSnO2. The results are cross-verified using conductance method and saturation photovoltage technique. The Dit difference is associated with the presence of oxidized (Sn(4+)) and elemental Sn in the interfacial layer oxide.

Establishment of pseudoternary LiO0.5-NiO-MnO2 phase diagram by combinatorial wet process.

A pseudoternary LiO0.5-NiO-MnO2 reaction phase diagram was established using a combinatorial high-throughput materials exploration process to find candidate electrode materials for lithium ion secondary batteries. Each powder library was prepared using our combinatorial wet process based on the electrostatic spray deposition method and results obtained at various firing temperatures in an air atmosphere and an oxide atmosphere. In the air atmosphere, newly composed single phase regions of a layered rock salt-type structure were only found around Li2MnO3 at 800 °C. On the other hand, in the oxide atmosphere, most of the powder library showed the multiphase of the spinel and layered rock salt type structure.