RESUMO
The effectiveness of ion beam planarization (IBP) to reduce surface roughness of diamond turned NiP surfaces was investigated. The surfaces with various spatial wavelengths and depths of turning marks were spray-coated and planarized with broad ion beam. The ion beam planarization was performed at a special angle where the etching rate of photoresist is closely similar to NiP. It is found that the combined process of spray-coating and ion-beam-planarization can effectively reduce the surface roughness of diamond turned NiP. The spatial wavelength and depth of turning marks have limited influence on surface roughness reduction rate. The final surface roughness after ion beam planarization is 30%~40% of the original roughness, irrespective of spatial wavelength and depth of turning marks. Extending planarization time does not alter surface quality after photoresist is etched away. These results show that the IBP is applicable to roughness minimization of diamond turned surfaces.
RESUMO
We propose a method for fabricating a spherical lens array mold by electrical discharge machining (EDM) with a ball-type electrode. The electrode is constructed by arranging conductive spherical balls in an array. To fundamentally examine the applicability of the proposed EDM method to the fabrication of lens array molds, we use an electrode having a single ball to shape a lens array mold made of stainless steel with 16 spherical elements, each having a maximum depth of 0.5 mm. As a result, a mold surface is successfully shaped with a peak-to-valley shape accuracy of approximately 10 µm, and an average surface roughness of 0.85 µm.
RESUMO
We propose a method for fabricating a lens array mold by electrical discharge machining (EDM). In this method, the tips of rods are machined individually to form a specific surface, and then a number of the machined rods are arranged to construct an electrode for EDM. The repetition of the EDM process using the electrode enables a number of lens elements to be produced on the mold surface. The effectiveness of our proposed method is demonstrated by shaping a lens array mold made of stainless steel with 16 spherical elements, in which the EDM process with a single rod electrode is repeatedly conducted.
RESUMO
We propose a plasma chemical vaporization machining device with a hemispherical tip electrode for optical fabrication. Radio-frequency plasma is generated close to the electrode under atmospheric conditions, and a workpiece is scanned relative to the stationary electrode under three-axis motion control to remove target areas on a workpiece surface. Experimental results demonstrate that surface removal progresses although process gas is not forcibly supplied to the plasma. The correction of shape errors on conventionally polished spheres is performed. As a result, highly accurate smooth surfaces with the desired rms shape accuracy of 3 nm are successfully obtained, which confirms that the device is effective for the fabrication of optics.
RESUMO
Plasma chemical vaporization machining (CVM) is a high-precision chemical shaping method using rf plasma generated in the proximity of an electrode in an atmospheric environment. The purpose of the present study is to clarify the removal characteristics of plasma CVM using a pipe electrode. Polished fused silica plates were processed by plasma CVM, polishing, and precision grinding under various conditions. The removal rate of plasma CVM was about 4 to 1100 times faster than that of polishing, and the maximum removal rate was almost equal to that of precision grinding. The roughness of the resultant surfaces was almost the same as that of the polished surfaces.
RESUMO
We have developed plasma chemical vaporization machining by using a microelectrode for the fabrication of small complex-shaped optical surfaces. In this method, a 0.5 mm diameter pipe microelectrode, from which processing gas is drawn in, generates a small localized plasma that is scanned over a workpiece under numerical computer control to shape a desired surface. A 12 mm x 12 mm nonaxisymmetric mirror with a maximum depth of approximately 3 microm was successfully fabricated with a peak-to-valley shape accuracy of 0.04 microm in an area excluding the edges of the mirror. The average surface roughness was 0.58 nm, which is smooth enough for optical use.
RESUMO
We figure optical surfaces by plasma chemical vaporization machining (CVM) with a pipe electrode, in which an rf plasma generated at the electrode tip under approximately atmospheric pressure moves over the surfaces. We propose a shaping method in which the movement of plasma on the surfaces can be determined. Flat and aspheric surfaces are successfully figured with the desired peak-to-valley shape accuracy of 0.1 microm. The root-mean-square roughness of the resultant surfaces is at the subnanometer level. These results confirm that the plasma CVM and the shaping method have the capability to fabricate optics with high accuracy.