Waste Plastic-Supported Pd Single-Atom Catalyst for Hydrogenation.

As worldwide plastic pollution continues to rise, innovative ideas for effective reuse and recycling of waste plastic are needed. Single-atom catalysts (SACs), which are known for their high activity and selectivity, present unique advantages in facilitating plastic degradation and conversion. Waste plastic can be used as a support or raw material to create SACs, which reduces waste generation while simultaneously utilizing waste as a resource. This work successfully utilized waste plastic polyurethane (PU) as a support, through a unique Rapid Thermal Processing Reactor (RTPR) to synthesize an efficient Pd1/PU SACs. At 25 °C and 0.5 MPa H2, Pd1/PU displayed outstanding activity and selectivity in the hydrogenation of styrene, as well as remarkable stability. Pd1/PU performed well in hydrogenating a variety of common substrates. These findings highlight the great potential of SACs in plastic waste reuse and recycling, offering intriguing solutions to the global plastic pollution problem.

Preparation of Al-Containing ZSM-58 Zeolite Membranes Using Rapid Thermal Processing for CO2/CH4 Mixture Separation.

The synthesis of DDR-type zeolite membranes faces the problem of cracks that occur on the zeolite membrane due to differences in the thermal expansion coefficient between zeolite and the porous substrate during the detemplating process. In this study, Al-containing ZSM-58 zeolite membranes with DDR topology were prepared by rapid thermal processing (RTP), with the aim of developing a reproducible method for preparing DDR zeolite membrane without cracks. Moreover, we verified the influence of RTP before performing conventional thermal calcination (CTC) on ZSM-58 membranes with various silica-to-aluminum (Si/Al) molar ratios. Using the developed method, an Al-containing ZSM-58 membrane without cracks was obtained, along with complete template removal by RTP, and it had higher CO2/CH4 selectivity. An all-silica ZSM-58 membrane without cracks was obtained by only using the ozone detemplating method. ZSM-58 crystals and membranes with various Si/Al molar ratios were analyzed by using Fourier-transform infrared (FTIR) spectroscopy to confirm the effects of RTP treatment. Al-containing ZSM-58 zeolites had higher silanol concentrations than all-silica zeolites, confirming many silanol condensations by RTP. The condensation of silanol forms results in the formation of siloxane bonds and stronger resistance to thermal stress; therefore, RTP caused crack suppression in Al-containing ZSM-58 membranes. The results demonstrate that Al-containing ZSM-58 zeolite membranes with high CO2 permeance and CO2/CH4 selectivity and minimal cracking can be produced by using RTP.

Development of Hybrid and Templated Silica-P123 Membranes for Brackish Water Desalination.

Water scarcity is still a pressing issue in many regions. The application of membrane technology through water desalination to convert brackish to potable water is a promising technology to solve this issue. This study compared the performance of templated TEOS-P123 and ES40-P123 hybrid membranes for brackish water desalination. The membranes were prepared by the sol-gel method by employing tetraethyl orthosilicate (TEOS) for the carbon-templated silica (soft template) and ethyl silicate (ES40) for the hybrid organo-silica. Both sols were templated by adding 35 wt.% of pluronic triblock copolymer (P123) as the carbon source. The silica-templated sols were dip-coated onto alumina support (four layers) and were calcined by using the RTP (rapid thermal processing) method. The prepared membranes were tested using pervaporation set up at room temperature (~25 °C) using brackish water (0.3 and 1 wt.%) as the feed. It was found that the hybrid membrane exhibited the highest specific surface area (6.72 m2·g-1), pore size (3.67 nm), and pore volume (0.45 cm3·g-1). The hybrid ES40-P123 was twice thicker (2 µm) than TEOS-P123-templated membranes (1 µm). Lastly, the hybrid ES40-P123 displayed highest water flux of 6.2 kg·m-2·h-1. Both membranes showed excellent robustness and salt rejections of >99%.

Novel and efficient purification of silicon through ultrasonic-Cu catalyzed chemical leaching.

The present study proposed a novel and efficient ultrasonic-Cu catalyzed chemical leaching (U-CuCCL) method to purify large-sized industrial silicon powders. Different from the traditional ultrasonic-HF (U-HF) leaching method, U-CuCCL and U-CuCCL combined rapid thermal processing (U-CuCCL + RTP) were performed to investigate the efficiency of removing the main impurities Fe, Al, Ca, Ti, Ni, V, Cu, and Mn. The evolution of typical precipitates phases on the surface of silicon before and after leaching were observed and analyzed by electron probe micro analyzer. The results show that the impurities removal can be significantly improved under the ultrasonically strengthen process, especially the U-CuCCL process shows a high-efficient impurities removal efficiency. After the U-CuCCL, the etched silicon powders accompanied with numerous porous structure are obtained which is beneficial for the removal of impurities. Notably, it was found that the rapid thermal processing is beneficial for the residual impurities diffuse to the porous layer surface and the purity of silicon powder can be significantly increased from 99.3% to 99.995%.

Hierarchical Order in Dewetted Block Copolymer Thin Films on Chemically Patterned Surfaces.

We investigated the dewetting process on flat and chemically patterned surfaces of ultrathin films (thickness between 2 and 15 nm) of a cylinder forming polystyrene- block-poly(methyl methacrylate) (PS- b-PMMA) spin coated on poly(styrene- r-methyl methacrylate) random copolymers (RCPs). When the PS- b-PMMA film dewets on a 2 nm-thick RCP layer, the ordering of the hexagonally packed PMMA cylinders in the dewetted structures extends over distances far exceeding the correlation length obtained in continuous block copolymer (BCP) films. As a result, micrometer-sized circular droplets featuring defectless single grains of self-assembled PS- b-PMMA with PMMA cylinders perpendicularly oriented with respect to the substrate are generated and randomly distributed on the substrate. Additionally, alignment of the droplets along micrometric lines was achieved by performing the dewetting process on large-scale chemically patterned stripes of 2 nm thick RCP films by laser lithography. By properly adjusting the periodicity of the chemical pattern, it was possible to tune and select the geometrical characteristics of the dewetted droplets in terms of maximum thickness, contact angle and diameter while maintaining the defectless single grain perpendicular cylinder morphology of the circular droplets.

GISAXS Analysis of the In-Depth Morphology of Thick PS-b-PMMA Films.

The morphological evolution of cylinder-forming poly(styrene)-b-poly(methyl methacrylate) block copolymer (BCP) thick films treated at high temperatures in the rapid thermal processing (RTP) machine was monitored by means of in-depth grazing-incidence small-angle X-ray scattering (GISAXS). The use of this nondisruptive technique allowed one to reveal the formation of buried layers composed of both parallel- and perpendicular-oriented cylinders as a function of the film thickness (24 ≤ h ≤ 840 nm) and annealing time (0 ≤ t ≤ 900 s). Three distinct behaviors were observed depending on the film thickness. Up to h ≤ 160 nm, a homogeneous film consisting of perpendicular-oriented cylinders is observed. When h is between 160 and 700 nm, a decoupling process between both the air-BCP and substrate-BCP interfaces takes place, leading to the formation of mixed orientations (parallel and perpendicular) of the cylinders. Finally, for h > 700 nm, the two interfaces are completely decoupled, and the formation of a superficial layer of about 50 nm composed of perpendicular cylinders is observed. Furthermore, the through-film morphology affects the nanodomain long-range order, which substantially decreases in correspondence with the beginning of the decoupling process. When the thick samples are exposed to longer thermal treatments, an increase in the long-range order of the nanodomains occurs, without any sensible variation of the thickness of the superficial layer.

Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses.

Block copolymers (BCPs) are emerging as a cost-effective nanofabrication tool to complement conventional optical lithography because they self-assemble in highly ordered polymeric templates with well-defined sub-20-nm periodic features. In this context, cylinder-forming polystyrene-block-poly(methyl methacrylate) BCPs are revealed as an interesting material of choice because the orientation of the nanostructures with respect to the underlying substrate can be effectively controlled by a poly(styrene-random-methyl methacrylate) random copolymer (RCP) brush layer grafted to the substrate prior to BCP deposition. In this work, we investigate the self-assembly process and lateral order evolution in RCP + BCP systems consisting of cylinder-forming PS-b-PMMA (67 kg mol-1, PS fraction of ∼70%) films with thicknesses of 30, 70, 100, and 130 nm deposited on RCP brush layers having thicknesses ranging from 2 to 20 nm. The self-assembly process is promoted by a rapid thermal processing machine operating at 250 °C for 300 s. The level of lateral order is determined by measuring the correlation length (ξ) in the self-assembled BCP films. Moreover, the amount of solvent (Φ) retained in the RCP + BCP systems is measured as a function of the thicknesses of the RCP and BCP layers, respectively. In the 30-nm-thick BCP films, an increase in Φ as a function of the thickness of the RCP brush layer significantly affects the self-assembly kinetics and the final extent of the lateral order in the BCP films. Conversely, no significant variations of ξ are observed in the 70-, 100-, and 130-nm-thick BCP films with increasing Φ.

Enhanced Performance of Inverted Polymer Solar Cells by Combining ZnO Nanoparticles and Poly[(9,9-bis(3'-(N,N-dimethylamino)propyl)-2,7-fluorene)-alt-2,7-(9,9-dioctyfluorene)] as Electron Transport Layer.

A highly efficient inverted polymer solar cell (PSC) has been successfully demonstrated by using a ZnO nanoparticle (NP) and poly[(9,9-bis(3'-(N,N-dimethylamino)propyl)-2,7-fluorene)-alt-2,7-(9,9-dioctyfluorene)] (PFN) bilayer structure as an effective electron collecting layer. This ZnO/PFN bilayer structure is designed to combine the advantages of both ZnO and PFN, based on the performance comparison of ZnO-only, PFN-only, and ZnO/PFN bilayer devices in our work. ZnO NPs can serve as an efficient electron transport and buffer layer for reduced series resistance, while the PFN interlayer can improve the energy level alignment of devices through the formation of an interfacial dipole. With the enhanced electron extraction induced by the ZnO/PFN bilayer structure and PTB7:ICBA:PC71BM ternary system, the corresponding inverted PSC device shows a high PCE of 9.3%, which is more than a 15% improvement compared to the ZnO- or PFN-only devices.

Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments.

Block copolymer (BCP) self-assembly is expected to complement conventional optical lithography for the fabrication of next-generation microelectronic devices. In this regard, silicon-containing BCPs with a high Flory-Huggins interaction parameter (χ) are extremely appealing because they form high-resolution nanostructures with characteristic dimensions below 10 nm. However, due to their slow self-assembly kinetics and low thermal stability, these silicon-containing high-χ BCPs are usually processed by solvent vapor annealing or in solvent-rich ambient at a low annealing temperature, significantly increasing the complexity of the facilities and of the procedures. In this work, the self-assembly of cylinder-forming polystyrene-block-poly(dimethylsiloxane-random-vinylmethylsiloxane) (PS-b-P(DMS-r-VMS)) BCP on flat substrates is promoted by means of a simple thermal treatment at high temperatures. Homogeneous PS-b-P(DMS-r-VMS) thin films covering the entire sample surface are obtained without any evidence of dewetting phenomena. The BCP arranges in a single layer of cylindrical P(DMS-r-VMS) nanostructures parallel-oriented with respect to the substrate. By properly adjusting the surface functionalization, the heating rate, the annealing temperature, and the processing time, one can obtain correlation length values larger than 1 µm in a time scale fully compatible with the stringent requirements of the microelectronic industry.

Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent.

The self-assembly of block copolymer (BCP) thin films produces dense and ordered nanostructures. Their exploitation as templates for nanolithography requires the capability to control the lateral order of the nanodomains. Among a multiplicity of polymers, the widely studied all-organic polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP can easily form nanodomains perpendicularly oriented with respect to the substrate, since the weakly unbalanced surface interactions are effectively neutralized by grafting to the substrate an appropriate poly(styrene-random-methyl methacrylate) P(S-r-MMA) random copolymer (RCP). This benefit along with the selective etching of the PMMA component and the chemical similarity with the standard photoresist materials deserved for PS-b-PMMA the role of BCP of choice for the technological implementation in nanolithography. This work demonstrates that the synergic effect of thermal annealing with the initial solvent naturally trapped in the basic RCP + BCP system after the deposition process can be exploited to enhance the lateral order. The solvent content embedded in the total RCP + BCP system can be tuned by changing the molecular weight and thus the thickness of the grafted RCP brush layer, without introducing external reservoirs or dedicated setup and/or systems. The appropriate supply of solvent supports a grain coarsening kinetics following a power law with a 1/3 growth exponent for standing hexagonally ordered cylinders.

Ultrathin random copolymer-grafted layers for block copolymer self-assembly.

Hydroxyl-terminated P(S-r-MMA) random copolymers (RCPs) with molecular weights (Mn) from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a silicon oxide surface and subsequently used to study the orientation of nanodomains with respect to the substrate, in cylinder-forming PS-b-PMMA block copolymer (BCP) thin films. When the thickness (H) of the grafted layer is greater than 5-6 nm, a perpendicular orientation is always observed because of the efficient decoupling of the BCP film from the polar SiO2 surface. Conversely, if H is less than 5 nm, the critical thickness of the grafted layer, which allows the neutralization of the substrate and promotion of the perpendicular orientation of the nanodomains in the BCP film, is found to depend on the Mn of the RCP. In particular, when Mn = 1700, a 2.0 nm thick grafted layer is sufficient to promote the perpendicular orientation of the PMMA cylinders in the PS-b-PMMA BCP film. A proximity shielding mechanism of the BCP molecules from the polar substrate surface, driven by chain stretching of the grafted RCP molecules, is proposed.

Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications.

Two strategies are envisioned to improve the thermal stability of the grafted layer and to allow the processing of the random copolymer/block copolymer (RCP/BCP) system at high temperature. From one side, a high-temperature thermal treatment of a commercial α-hydroxyl ω-2,2,6,6-tetramethylpiperidinyloxy functional RCP, namely, TR58, leads to the formation of a stabilized layer able to induce the perpendicular orientation of a symmetric BCP to temperatures higher than 310 °C. On the other side, an α-hydroxyl ω-Br functional RCP, namely, BrR58, with the same molar mass and composition of TR58, was prepared by activator regenerated by electron transfer atom transfer radical polymerization. The resulting brush layer can sustain the self-assembly of the symmetric BCP for processing temperatures as high as 330 °C. In both systems, the disruption of the BCP film, deposited on the grafted RCP layer, occurs because of the formation of bubbles, due to a low-temperature evolution of monomers from the RCP layer. The extent of the low-temperature monomer evolution is higher for TR58 than it is for BrR58 and starts at lower temperatures. For both copolymers, the thermal treatment offsets the low-temperature monomer evolution while still maintaining surface characteristics suitable to induce the perpendicular orientation of the BCPs, thus ultimately extending the range of processing temperatures of the BCP film and consequently speeding the self-organization process.

High aspect ratio PS-b-PMMA block copolymer masks for lithographic applications.

The control of the self-assembly (SA) process and nanostructure orientation in diblock copolymer (DBC) thick films is a crucial technological issue. Perpendicular orientation of the nanostructures in symmetric and asymmetric poly(styrene)-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymer films obtained by means of simple thermal treatments was demonstrated to occur in well-defined thickness windows featuring modest maximum values, thus resulting in low aspect ratio (h/d < 2) of the final lithographic mask. In this manuscript, the thickness window corresponding to the perpendicular orientation of the cylindrical structures in asymmetric DBC is investigated at high temperatures (190 °C ≤ T ≤ 310 °C) using a rapid thermal processing machine. A systematic study of the annealing conditions (temperature and time) of asymmetric PS-b-PMMA (Mn = 67.1, polydispersity index = 1.09) films, with thicknesses ranging from 10 to 400 nm, allowed ordered patterns, with a maximum value of orientational correlation length of 350 nm, to be obtained for film thicknesses up to 200 nm. The complete propagation of the cylindrical structures through the whole film thickness in a high aspect ratio PS template (h/d ≈ 7) is probed by lift-off process. Si nanopillars are obtained having the same lateral ordering and characteristic dimensions of the DBC lithographic mask as further confirmed by grazing-incidence small-angle X-ray scattering experiments.