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Negative ion formation and motion in a mixture of CCl4 and Ar.
Yousif, F B; Martínez, H.
  • Yousif FB; Facultad de Ciencias, Universidad Autonoma del Estado de Morelos, Avenida, Universidad 1001, Colonia Chamilpa, Codigo Postal 62210 Cuernavaca, Morelos, Mexico. fbyousif@servm.fc.uaem.mx
Phys Rev E Stat Nonlin Soft Matter Phys ; 69(4 Pt 2): 046401, 2004 Apr.
Article en En | MEDLINE | ID: mdl-15169100
This paper deals with the measurement of the mobility of negative ions in the mixtures of CCl4 with Ar with the CCl4 ratio up to 33.3%. The pulsed Townsend technique was employed to produce an integrated ionic avalanche over a range of the density-reduced electric field E/N for which ionization is either negligible or absent, and attachment processes are dominant, leading to the formation of mostly CCl-4. The E/N range of measurement was 1-50 Td (1 Td=10(-17) V cm(2)). Our measurements strongly suggest that attachment is the dominant process and only negative ions are formed.
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Banco de datos: MEDLINE Idioma: En Año: 2004 Tipo del documento: Article
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Banco de datos: MEDLINE Idioma: En Año: 2004 Tipo del documento: Article