Large-Area Patterning of Metal Nanostructures by Dip-Pen Nanodisplacement Lithography for Optical Applications.

Chen, Lina; Wei, Xiaoling; Zhou, Xuechang; Xie, Zhuang; Li, Kan; Ruan, Qifeng; Chen, Chaojian; Wang, Jianfang; Mirkin, Chad A; Zheng, Zijian.

Chen L; Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Wei X; Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Zhou X; Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Xie Z; Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Li K; Department of Chemistry and International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
Ruan Q; Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Chen C; Department of Physics, The Chinese University of Hong Kong, Shatin, Hong Kong SAR, China.
Wang J; Laboratory for Advanced Interfacial Materials and Devices, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hong Kong SAR, China.
Mirkin CA; Department of Physics, The Chinese University of Hong Kong, Shatin, Hong Kong SAR, China.
Zheng Z; Department of Chemistry and International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.