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Fabrication and Imaging of Monolayer Phosphorene with Preferred Edge Configurations via Graphene-Assisted Layer-by-Layer Thinning.
Lee, Yangjin; Lee, Sol; Yoon, Jun-Yeong; Cheon, Jinwoo; Jeong, Hu Young; Kim, Kwanpyo.
  • Lee Y; Department of Physics , Yonsei University , Seoul 03722 , Korea.
  • Lee S; Center for Nanomedicine , Institute for Basic Science (IBS) , Seoul 03722 , Korea.
  • Yoon JY; Department of Physics , Yonsei University , Seoul 03722 , Korea.
  • Cheon J; Center for Nanomedicine , Institute for Basic Science (IBS) , Seoul 03722 , Korea.
  • Jeong HY; Department of Physics , Yonsei University , Seoul 03722 , Korea.
  • Kim K; Center for Nanomedicine , Institute for Basic Science (IBS) , Seoul 03722 , Korea.
Nano Lett ; 20(1): 559-566, 2020 Jan 08.
Article en En | MEDLINE | ID: mdl-31790269
ABSTRACT
Phosphorene, a monolayer of black phosphorus (BP), is an elemental two-dimensional material with interesting physical properties, such as high charge carrier mobility and exotic anisotropic in-plane properties. To fundamentally understand these various physical properties, it is critically important to conduct an atomic-scale structural investigation of phosphorene, particularly regarding various defects and preferred edge configurations. However, it has been challenging to investigate mono- and few-layer phosphorene because of technical difficulties arising in the preparation of a high-quality sample and damages induced during the characterization process. Here, we successfully fabricate high-quality monolayer phosphorene using a controlled thinning process with transmission electron microscopy and subsequently perform atomic-resolution imaging. Graphene protection suppresses the e-beam-induced damage to multilayer BP and one-side graphene protection facilitates the layer-by-layer thinning of the samples, rendering high-quality monolayer and bilayer regions. We also observe the formation of atomic-scale crystalline edges predominantly aligned along the zigzag and (101) terminations, which is originated from edge kinetics under e-beam-induced sputtering process. Our study demonstrates a new method to image and precisely manipulate the thickness and edge configurations of air-sensitive two-dimensional materials.
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2020 Tipo del documento: Article

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2020 Tipo del documento: Article