Phase evolution of ultra-thin Ni silicide films on CF<sub>4</sub> plasma immersion ion implanted Si. | Nanotechnology;31(20): 205201, 2020 May 15. | MEDLINE

Main content 1 Search 2 Footer 3

+A A -A High contrast

Biblioteca Virtual en Salud

BVS - Literatura Cientifica y Técnica

Localizar descriptor de asunto Búsqueda Avanzada

Phase evolution of ultra-thin Ni silicide films on CF₄ plasma immersion ion implanted Si.

Zhao, Lan-Tian; Liu, Mingshan; Ren, Qing-Hua; Liu, Chen-He; Liu, Qiang; Chen, Ling-Li; Spiegel, Yohann; Torregrosa, Frank; Yu, Wenjie; Zhao, Qing-Tai.

Zhao LT; State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China and University of Chinese Academy of Sciences, Beijing 100049, People's Republic of China.

Nanotechnology ; 31(20): 205201, 2020 May 15.

Article en En | MEDLINE | ID: mdl-31952059

Search on Google

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2020 Tipo del documento: Article

Search on Google

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2020 Tipo del documento: Article