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Publisher Correction: Enhanced ferroelectricity in ultrathin films grown directly on silicon.
Cheema, Suraj S; Kwon, Daewoong; Shanker, Nirmaan; Dos Reis, Roberto; Hsu, Shang-Lin; Xiao, Jun; Zhang, Haigang; Wagner, Ryan; Datar, Adhiraj; McCarter, Margaret R; Serrao, Claudy R; Yadav, Ajay K; Karbasian, Golnaz; Hsu, Cheng-Hsiang; Tan, Ava J; Wang, Li-Chen; Thakare, Vishal; Zhang, Xiang; Mehta, Apurva; Karapetrova, Evguenia; Chopdekar, Rajesh V; Shafer, Padraic; Arenholz, Elke; Hu, Chenming; Proksch, Roger; Ramesh, Ramamoorthy; Ciston, Jim; Salahuddin, Sayeef.
  • Cheema SS; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA. s.cheema@berkeley.edu.
  • Kwon D; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Shanker N; Department of Electrical Engineering, Inha University, Incheon, South Korea.
  • Dos Reis R; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.
  • Hsu SL; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Xiao J; National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
  • Zhang H; National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
  • Wagner R; Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
  • Datar A; Nanoscale Science and Engineering Center, University of California, Berkeley, CA, USA.
  • McCarter MR; Asylum Research, Oxford Instruments, Santa Barbara, CA, USA.
  • Serrao CR; Asylum Research, Oxford Instruments, Santa Barbara, CA, USA.
  • Yadav AK; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.
  • Karbasian G; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Hsu CH; Department of Physics, University of California, Berkeley, Berkeley, CA, USA.
  • Tan AJ; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Wang LC; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Thakare V; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Zhang X; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Mehta A; Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA, USA.
  • Karapetrova E; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.
  • Chopdekar RV; Department of Materials Science and Engineering, University of California, Berkeley, CA, USA.
  • Shafer P; Nanoscale Science and Engineering Center, University of California, Berkeley, CA, USA.
  • Arenholz E; Stanford Synchrotron Radiation Lightsource, SLAC National Accelerator Laboratory, Menlo Park, CA, USA.
  • Hu C; Advanced Photon Source, Argonne National Laboratory, Argonne, IL, USA.
  • Proksch R; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
  • Ramesh R; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
  • Ciston J; Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA, USA.
  • Salahuddin S; Cornell High Energy Synchrotron Source, Cornell University, Ithaca, NY, USA.
Nature ; 581(7808): E5, 2020 May.
Article en En | MEDLINE | ID: mdl-32433606
ABSTRACT
An amendment to this paper has been published and can be accessed via a link at the top of the paper.
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2020 Tipo del documento: Article
Texto completo
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2020 Tipo del documento: Article