Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid.

Kirchner, Robert; Neumann, Volker; Winkler, Felix; Strobel, Carsten; Völkel, Sandra; Hiess, André; Kazazis, Dimitrios; Künzelmann, Ulrich; Bartha, Johann Wolfgang.

Kirchner R; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Neumann V; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Winkler F; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Strobel C; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Völkel S; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Hiess A; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Kazazis D; Paul Scherrer Institute, Laboratory for Micro- and Nanotechnology, Villigen, PSI 5232, Switzerland.
Künzelmann U; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.
Bartha JW; Institute of Semiconductors and Microsystems, Technische Universität Dresden, Dresden, 01062, Germany.