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Chiral Silica with Preferred-Handed Helical Structure via Chiral Transfer.
Manabe, Kei; Tsai, Sung-Yu; Kuretani, Satoshi; Kometani, Satoshi; Ando, Katsuyuki; Agata, Yoshihiro; Ohta, Noboru; Chiang, Yeo-Wan; Lin, I-Ming; Fujii, Syuji; Nakamura, Yoshinobu; Chang, Yu-Ning; Nabae, Yuta; Hayakawa, Teruaki; Wang, Chien-Lung; Li, Ming-Chia; Hirai, Tomoyasu.
  • Manabe K; Department of Applied Chemistry, Faculty of Engineering and Graduate School of Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan.
  • Tsai SY; Department of Applied Chemistry, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan.
  • Kuretani S; Department of Applied Chemistry, Faculty of Engineering and Graduate School of Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan.
  • Kometani S; Department of Applied Chemistry, Faculty of Engineering and Graduate School of Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan.
  • Ando K; Department of Applied Chemistry, Faculty of Engineering and Graduate School of Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan.
  • Agata Y; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo 152-8552, Japan.
  • Ohta N; Japan Synchrotron Radiation Research Institute, SPring-8, Sayo, Hyogo 679-5198, Japan.
  • Chiang YW; Department of Materials and Optoelectronic Science, Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan.
  • Lin IM; Department of Materials and Optoelectronic Science, Center for Nanoscience and Nanotechnology, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan.
  • Fujii S; Department of Applied Chemistry, Faculty of Engineering and Graduate School of Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan.
  • Nakamura Y; Department of Applied Chemistry, Faculty of Engineering and Graduate School of Engineering, Osaka Institute of Technology, 5-16-1 Omiya, Asahi-ku, Osaka 535-8585, Japan.
  • Chang YN; Department of Biological Science and Technology, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan.
  • Nabae Y; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo 152-8552, Japan.
  • Hayakawa T; Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, 2-12-1-S8-36 Ookayama, Meguro-ku, Tokyo 152-8552, Japan.
  • Wang CL; Department of Applied Chemistry, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan.
  • Li MC; Department of Biological Science and Technology, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30010, Taiwan.
  • Hirai T; Department of Biological Science and Technology, Center For Intelligent Drug Systems and Smart Bio-devices (IDS2B), National Yang Ming Chiao Tung University, Hsinchu 30010, Taiwan.
JACS Au ; 1(4): 375-379, 2021 Apr 26.
Article en En | MEDLINE | ID: mdl-34467302
ABSTRACT
A strategy to obtain chiral silica using an achiral stereoregular polymer with polyhedral oligomeric silsesquioxane (POSS) side chains is described herein. The preferred helical conformation of the POSS-containing polymer could be achieved by mixing isotactic polymethacrylate-functionalized POSS (it-PMAPOSS) and a chiral dopant. The array structure of POSS molecules, which are placed along the helical conformation, is memorized even after removing the chiral dopant at high temperatures, leading to a chiral silica compound with exclusive optical activity after calcination.
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2021 Tipo del documento: Article
Texto completo
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PubMed Links
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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2021 Tipo del documento: Article