High-Performance and Radiation-Hardened Solution-Processed ZrLaO Gate Dielectrics for Large-Area Applications.

Fang, Yuxiao; Zhao, Chun; Mitrovic, Ivona Z; Zhao, Cezhou.

Fang Y; Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3GJ, United Kingdom.
Zhao C; Printable Electronics Research Center, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China.
Mitrovic IZ; Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3GJ, United Kingdom.
Zhao C; Department of Electrical and Electronic Engineering, Xi'an Jiaotong-Liverpool University, Suzhou 215123, China.

ACS Appl Mater Interfaces ; 13(42): 50101-50110, 2021 Oct 27.

Article en En | MEDLINE | ID: mdl-34636544