Water assisted atomic layer deposition of yttrium oxide using tris(<i>N</i>,<i>N</i>'-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties.

Mai, Lukas; Boysen, Nils; Subasi, Ersoy; Arcos, Teresa de Los; Rogalla, Detlef; Grundmeier, Guido; Bock, Claudia; Lu, Hong-Liang; Devi, Anjana

Water assisted atomic layer deposition of yttrium oxide using tris(N,N'-diisopropyl-2-dimethylamido-guanidinato) yttrium(iii): process development, film characterization and functional properties.

Mai, Lukas; Boysen, Nils; Subasi, Ersoy; Arcos, Teresa de Los; Rogalla, Detlef; Grundmeier, Guido; Bock, Claudia; Lu, Hong-Liang; Devi, Anjana.

Mai L; Inorganic Materials Chemistry, Ruhr-University Bochum 44801 Bochum Germany anjana.devi@rub.de.
Boysen N; Inorganic Materials Chemistry, Ruhr-University Bochum 44801 Bochum Germany anjana.devi@rub.de.
Subasi E; Werkstoffe und Nanoelektronik, Ruhr-Universität Bochum 44801 Bochum Germany.
Arcos TL; Macromolecular and Technical Chemistry, University of Paderborn 33098 Paderborn Germany.
Rogalla D; RUBION, Ruhr-University Bochum 44801 Bochum Germany.
Grundmeier G; Macromolecular and Technical Chemistry, University of Paderborn 33098 Paderborn Germany.
Bock C; Mikrosystemtechnik, Ruhr-Universität Bochum 44801 Bochum Germany.
Lu HL; Institute of Advanced Nanodevices, School of Microelectronics, Fudan University Shanghai 200433 China.
Devi A; Inorganic Materials Chemistry, Ruhr-University Bochum 44801 Bochum Germany anjana.devi@rub.de.

RSC Adv ; 8(9): 4987-4994, 2018 Jan 24.

Article en En | MEDLINE | ID: mdl-35539551

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Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2018 Tipo del documento: Article