Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations.

Defoort-Levkov, Grégoire R N; Bahm, Alan; Philipp, Patrick.

Defoort-Levkov GRN; Advanced Instrumentation for Nano-Analytics (AINA), Materials Research and Technology Department (MRT), Luxembourg Institute of Science and Technology (LIST), 4422 Belvaux, Luxembourg.
Bahm A; University of Luxembourg, 4365 Esch-sur-Alzette, Luxembourg.
Philipp P; Thermo Fisher Scientific, Hillsboro, OR, 97124, USA.

Beilstein J Nanotechnol ; 13: 986-1003, 2022.

Article en En | MEDLINE | ID: mdl-36225852