Putting High-Index Cu on the Map for High-Yield, Dry-Transferred CVD Graphene.

Burton, Oliver J; Winter, Zachary; Watanabe, Kenji; Taniguchi, Takashi; Beschoten, Bernd; Stampfer, Christoph; Hofmann, Stephan.

Burton OJ; Department of Engineering, University of Cambridge, CambridgeCB3 0FA, United Kingdom.
Winter Z; 2nd Institute of Physics A and JARA-FIT, RWTH Aachen University, 52074Aachen, Germany.
Watanabe K; Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki305-0044, Japan.
Taniguchi T; International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki305-0044, Japan.
Beschoten B; 2nd Institute of Physics A and JARA-FIT, RWTH Aachen University, 52074Aachen, Germany.
Stampfer C; 2nd Institute of Physics A and JARA-FIT, RWTH Aachen University, 52074Aachen, Germany.
Hofmann S; Peter Grünberg Institute (PGI-9), Forschungszentrum Jülich, 52425Jülich, Germany.

ACS Nano ; 2023 Jan 03.

Article en En | MEDLINE | ID: mdl-36594782