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A perspective on the physical scaling down of hafnia-based ferroelectrics.
Park, Ju Yong; Lee, Dong Hyun; Park, Geun Hyeong; Lee, Jaewook; Lee, Younghwan; Park, Min Hyuk.
  • Park JY; Department of Materials Science and Engineering & Inter-university Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea.
  • Lee DH; Department of Materials Science and Engineering & Inter-university Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea.
  • Park GH; Department of Materials Science and Engineering & Inter-university Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea.
  • Lee J; Department of Materials Science and Engineering & Inter-university Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea.
  • Lee Y; Research Institute of Advanced Materials, College of Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea.
  • Park MH; Department of Materials Science and Engineering & Inter-university Semiconductor Research Center, College of Engineering, Seoul National University, Gwanak-ro 1, Gwanak-gu, Seoul 08826, Republic of Korea.
Nanotechnology ; 34(20)2023 Feb 28.
Article en En | MEDLINE | ID: mdl-36745914

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2023 Tipo del documento: Article

Texto completo: 1 Banco de datos: MEDLINE Idioma: En Año: 2023 Tipo del documento: Article