Roadmap for phase change materials in photonics and beyond.

Prabhathan, Patinharekandy; Sreekanth, Kandammathe Valiyaveedu; Teng, Jinghua; Ko, Joo Hwan; Yoo, Young Jin; Jeong, Hyeon-Ho; Lee, Yubin; Zhang, Shoujun; Cao, Tun; Popescu, Cosmin-Constantin; Mills, Brian; Gu, Tian; Fang, Zhuoran; Chen, Rui; Tong, Hao; Wang, Yi; He, Qiang; Lu, Yitao; Liu, Zhiyuan; Yu, Han; Mandal, Avik; Cui, Yihao; Ansari, Abbas Sheikh; Bhingardive, Viraj; Kang, Myungkoo; Lai, Choon Kong; Merklein, Moritz; Müller, Maximilian J; Song, Young Min; Tian, Zhen; Hu, Juejun; Losurdo, Maria; Majumdar, Arka; Miao, Xiangshui; Chen, Xiao; Gholipour, Behrad; Richardson, Kathleen A; Eggleton, Benjamin J; Sharda, Kanudha; Wuttig, Matthias; Singh, Ranjan

Prabhathan, Patinharekandy; Sreekanth, Kandammathe Valiyaveedu; Teng, Jinghua; Ko, Joo Hwan; Yoo, Young Jin; Jeong, Hyeon-Ho; Lee, Yubin; Zhang, Shoujun; Cao, Tun; Popescu, Cosmin-Constantin; Mills, Brian; Gu, Tian; Fang, Zhuoran; Chen, Rui; Tong, Hao; Wang, Yi; He, Qiang; Lu, Yitao; Liu, Zhiyuan; Yu, Han; Mandal, Avik; Cui, Yihao; Ansari, Abbas Sheikh; Bhingardive, Viraj; Kang, Myungkoo; Lai, Choon Kong; Merklein, Moritz; Müller, Maximilian J; Song, Young Min; Tian, Zhen; Hu, Juejun; Losurdo, Maria; Majumdar, Arka; Miao, Xiangshui; Chen, Xiao; Gholipour, Behrad; Richardson, Kathleen A; Eggleton, Benjamin J; Sharda, Kanudha; Wuttig, Matthias; Singh, Ranjan.

Prabhathan P; Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 21 Nanyang Link, Singapore 637371, Singapore.
Sreekanth KV; Centre for Disruptive Photonic Technologies, The Photonic Institute, 50 Nanyang Avenue, Singapore 639798, Singapore.
Teng J; Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A∗STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore.
Ko JH; Institute of Materials Research and Engineering (IMRE), Agency for Science, Technology and Research (A∗STAR), 2 Fusionopolis Way, Innovis #08-03, Singapore 138634, Republic of Singapore.
Yoo YJ; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Jeong HH; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Lee Y; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Zhang S; School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Cao T; DELL, Center for Terahertz Waves and College of Precision Instrument and Optoelectronics Engineering, Key Laboratory of Optoelectronic Information Technology (Ministry of Education of China), Tianjin University, Tianjin 300072, China.
Popescu CC; DELL, School of Optoelectronic Engineering and Instrumentation Science, Dalian University of Technology, Dalian 116024, China.
Mills B; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Gu T; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Fang Z; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Chen R; Materials Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA, USA.
Tong H; Department of Electrical & Computer Engineering, University of Washington, Washington, Seattle, USA.
Wang Y; Department of Electrical & Computer Engineering, University of Washington, Washington, Seattle, USA.
He Q; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China.
Lu Y; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China.
Liu Z; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China.
Yu H; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China.
Mandal A; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China.
Cui Y; Institute of Advanced Materials, Beijing Normal University, Beijing 100875, China.
Ansari AS; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada.
Bhingardive V; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada.
Kang M; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada.
Lai CK; Nanoscale Optics Lab, ECE Department, University of Alberta, Edmonton, Canada.
Merklein M; CREOL, College of Optics and Photonics, University of Central Florida, Orlando, FL, USA.
Müller MJ; Institute of Photonics and Optical Science (IPOS), School of Physics, The University of Sydney, New South Wales, NSW 2006, Australia.
Song YM; The University of Sydney Nano Institute (Sydney Nano), The University of Sydney, New South Wales, NSW 2006, Australia.
Tian Z; Institute of Photonics and Optical Science (IPOS), School of Physics, The University of Sydney, New South Wales, NSW 2006, Australia.
Hu J; The University of Sydney Nano Institute (Sydney Nano), The University of Sydney, New South Wales, NSW 2006, Australia.
Losurdo M; Institute of Physics IA, RWTH Aachen University, 52074 Aachen, Germany.
Majumdar A; School of Electrical Engineering and Computer Science, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Miao X; Anti-Viral Research Center, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Chen X; AI Graduate School, Gwangju Institute of Science and Technology, Gwangju 61005, Republic of Korea.
Gholipour B; DELL, Center for Terahertz Waves and College of Precision Instrument and Optoelectronics Engineering, Key Laboratory of Optoelectronic Information Technology (Ministry of Education of China), Tianjin University, Tianjin 300072, China.
Richardson KA; Department of Materials Science & Engineering, Massachusetts Institute of Technology, Cambridge, MA, USA.
Eggleton BJ; Materials Research Laboratory, Massachusetts Institute of Technology, Cambridge, MA, USA.
Sharda K; Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia, CNR-ICMATE, Corso Stati Uniti 4, 35127 Padova, Italy.
Wuttig M; Department of Electrical & Computer Engineering, University of Washington, Washington, Seattle, USA.
Singh R; Wuhan National Research Center for Optoelectronics, School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan, China.