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Phase Manipulation between c(4 x 2) and p(2 x 2) on the Si(100) surface at 4.2 K.
Sagisaka, Keisuke; Fujita, Daisuke; Kido, Giyuu.
Afiliação
  • Sagisaka K; Nanomaterials Laboratory, National Institute for Materials Science, 1-2-1 Sengen Tsukuba, Ibaraki, 305-0047 Japan. SAGISAKA.Keisuke@nims.go.jp
Phys Rev Lett ; 91(14): 146103, 2003 Oct 03.
Article em En | MEDLINE | ID: mdl-14611540
Phase manipulation between c(4x2) and p(2x2) on the Si(100) surface has been demonstrated at 4.2 K for the first time using a low-temperature scanning tunneling microscope. We have discovered that it is possible to change the c(4x2) surface into the p(2x2) surface, artificially, through a flip-flop motion of the buckling dimers by using a sample bias voltage control. Also, scanning at a negative bias voltage or applying a pulse voltage can restore the c(4x2) surface. The STM images as a function of bias voltage and tunneling current reveal the interesting dynamics of the buckling dimers on the long debated surface. Our results will show that energetic tunneling electrons are most likely responsible for the observed phase transition from c(4x2) to p(2x2).
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Base de dados: MEDLINE Idioma: En Ano de publicação: 2003 Tipo de documento: Article
Buscar no Google
Base de dados: MEDLINE Idioma: En Ano de publicação: 2003 Tipo de documento: Article