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Persistent step-flow growth of strained films on vicinal substrates.
Hong, Wei; Lee, Ho Nyung; Yoon, Mina; Christen, Hans M; Lowndes, Douglas H; Suo, Zhigang; Zhang, Zhenyu.
Afiliação
  • Hong W; Division of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA.
Phys Rev Lett ; 95(9): 095501, 2005 Aug 26.
Article em En | MEDLINE | ID: mdl-16197223
We propose a model of persistent step flow, emphasizing dominant kinetic processes and strain effects. Within this model, we construct a morphological phase diagram, delineating a regime of step flow from regimes of step bunching and island formation. In particular, we predict the existence of concurrent step bunching and island formation, a new growth mode that competes with step flow for phase space, and show that the deposition flux and temperature must be chosen within a window in order to achieve persistent step flow. The model rationalizes the diverse growth modes observed in pulsed laser deposition of SrRuO3 on SrTiO3.
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Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2005 Tipo de documento: Article
Buscar no Google
Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2005 Tipo de documento: Article