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InAs/Si Hetero-Junction Nanotube Tunnel Transistors.
Hanna, Amir N; Fahad, Hossain M; Hussain, Muhammad M.
Afiliação
  • Hanna AN; Integrated Nanotechnology Lab, Electrical Engineering, Computer Electrical and Mathematical Sciences &Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia.
  • Fahad HM; Integrated Nanotechnology Lab, Electrical Engineering, Computer Electrical and Mathematical Sciences &Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia.
  • Hussain MM; Integrated Nanotechnology Lab, Electrical Engineering, Computer Electrical and Mathematical Sciences &Engineering Division, King Abdullah University of Science and Technology, Thuwal 23955-6900, Saudi Arabia.
Sci Rep ; 5: 9843, 2015 Apr 29.
Article em En | MEDLINE | ID: mdl-25923104
ABSTRACT
Hetero-structure tunnel junctions in non-planar gate-all-around nanowire (GAA NW) tunnel FETs (TFETs) have shown significant enhancement in 'ON' state tunnel current over their all-silicon counterpart. Here we show the unique concept of nanotube TFET in a hetero-structure configuration that is capable of much higher drive current as opposed to that of GAA NW TFETs.Through the use of inner/outer core-shell gates, a single III-V hetero-structured nanotube TFET leverages physically larger tunneling area while achieving higher driver current (ION) and saving real estates by eliminating arraying requirement. Numerical simulations has shown that a 10 nm thin nanotube TFET with a 100 nm core gate has a 5×normalized output current compared to a 10 nm diameter GAA NW TFET.

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2015 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2015 Tipo de documento: Article