Universal pattern transfer methods for metal nanostructures by block copolymer lithography.
Nanotechnology
; 26(37): 375301, 2015 Sep 18.
Article
em En
| MEDLINE
| ID: mdl-26302968
ABSTRACT
A universal block copolymer pattern transfer method was demonstrated to produce Co nanostructures consisting of arrays of lines or dots from a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer. Three processes were used liftoff, a damascene process, and ion beam etching using a hard mask of tungsten, including a sacrificial poly(methyl methacrylate) layer under the PS-b-PDMS for the etch and liftoff processes. The ion beam etch process produced the most uniform magnetic arrays. A structural and magnetic comparison in terms of uniformity, edge roughness and switching field distribution has been reported.
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MEDLINE
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En
Ano de publicação:
2015
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Article