Bridging the Gap between the Nanometer-Scale Bottom-Up and Micrometer-Scale Top-Down Approaches for Site-Defined InP/InAs Nanowires.

Zhang, Guoqiang; Rainville, Christophe; Salmon, Adrian; Takiguchi, Masato; Tateno, Kouta; Gotoh, Hideki.

Afiliação

Zhang G; NTT Basic Research Laboratories, NTT Corporation , 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Rainville C; NTT Nanophotonics Center, NTT Corporation , 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Salmon A; NTT Basic Research Laboratories, NTT Corporation , 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Takiguchi M; NTT Basic Research Laboratories, NTT Corporation , 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Tateno K; NTT Basic Research Laboratories, NTT Corporation , 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Gotoh H; NTT Nanophotonics Center, NTT Corporation , 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan.

ACS Nano ; 9(11): 10580-9, 2015 Nov 24.

Article em En | MEDLINE | ID: mdl-26348087