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Silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge.
Scopece, Daniele; Döbeli, Max; Passerone, Daniele; Maeder, Xavier; Neels, Antonia; Widrig, Beno; Dommann, Alex; Müller, Ulrich; Ramm, Jürgen.
Afiliação
  • Scopece D; nanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology , Überlandstrasse 129, CH-8600 , Dübendorf , Switzerland.
  • Döbeli M; Ion Beam Physics, ETH Zürich , Otto-Stern-Weg 5, CH-8093 , Zürich , Switzerland.
  • Passerone D; nanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology , Überlandstrasse 129, CH-8600 , Dübendorf , Switzerland.
  • Maeder X; Laboratory for Nanoscale Materials Science, Empa, Swiss Federal Laboratories for Materials Science and Technology , Überlandstrasse 129, CH-8600 Dübendorf , Switzerland.
  • Neels A; Center for X-ray Analytics, Empa, Swiss Federal Laboratories for Materials Science and Technology , Überlandstrasse 129, CH-8600 Dübendorf , Switzerland.
  • Widrig B; Oerlikon Surface Solutions AG, Oerlikon Balzers , Iramali 18, 9469 Balzers , Liechtenstein.
  • Dommann A; nanotech@surfaces laboratory, Empa, Swiss Federal Laboratories for Materials Science and Technology , Überlandstrasse 129, CH-8600 , Dübendorf , Switzerland.
  • Müller U; Laboratory for Nanoscale Materials Science, Empa, Swiss Federal Laboratories for Materials Science and Technology , Überlandstrasse 129, CH-8600 Dübendorf , Switzerland.
  • Ramm J; Oerlikon Surface Solutions AG, Oerlikon Balzers , Iramali 18, 9469 Balzers , Liechtenstein.
Sci Technol Adv Mater ; 17(1): 20-28, 2016.
Article em En | MEDLINE | ID: mdl-27877854

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article