Graphene-Assisted Antioxidation of Tungsten Disulfide Monolayers: Substrate and Electric-Field Effect.

Kang, Kyungnam; Godin, Kyle; Kim, Young Duck; Fu, Shichen; Cha, Wujoon; Hone, James; Yang, Eui-Hyeok.

Afiliação

Kang K; Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ, 07030, USA.
Godin K; Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ, 07030, USA.
Kim YD; Department of Mechanical Engineering, Columbia University, New York, NY, 10027, USA.
Fu S; Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ, 07030, USA.
Cha W; Department of Mechanical Engineering, Columbia University, New York, NY, 10027, USA.
Hone J; Department of Mechanical Engineering, Columbia University, New York, NY, 10027, USA.
Yang EH; Department of Mechanical Engineering, Stevens Institute of Technology, Hoboken, NJ, 07030, USA.

Adv Mater ; 29(18)2017 May.

Article em En | MEDLINE | ID: mdl-28234414