Sulfur Atoms Adsorbed on Cu(100) at Low Coverage: Characterization and Stability against Complexation.

Walen, Holly; Liu, Da-Jiang; Oh, Junepyo; Yang, Hyun Jin; Spurgeon, Peter M; Kim, Yousoo; Thiel, Patricia A

Walen, Holly; Liu, Da-Jiang; Oh, Junepyo; Yang, Hyun Jin; Spurgeon, Peter M; Kim, Yousoo; Thiel, Patricia A.

Afiliação

Walen H; Department of Chemistry, Iowa State University , Ames, Iowa 50011, United States.
Liu DJ; RIKEN Surface and Interface Science Laboratory , Wako, Saitama 351-0198, Japan.
Oh J; Ames Laboratory of the USDOE , Ames, Iowa 50011, United States.
Yang HJ; RIKEN Surface and Interface Science Laboratory , Wako, Saitama 351-0198, Japan.
Spurgeon PM; RIKEN Surface and Interface Science Laboratory , Wako, Saitama 351-0198, Japan.
Kim Y; Department of Chemistry, Iowa State University , Ames, Iowa 50011, United States.
Thiel PA; RIKEN Surface and Interface Science Laboratory , Wako, Saitama 351-0198, Japan.

J Phys Chem B ; 122(2): 963-971, 2018 01 18.

Article em En | MEDLINE | ID: mdl-28829614

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Texto completo: 1 Base de dados: MEDLINE Tipo de estudo: Qualitative_research Idioma: En Ano de publicação: 2018 Tipo de documento: Article

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Texto completo: 1 Base de dados: MEDLINE Tipo de estudo: Qualitative_research Idioma: En Ano de publicação: 2018 Tipo de documento: Article