Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH<sub>2</sub> Metal-Organic Framework.

Optimizing Toxic Chemical Removal through Defect-Induced UiO-66-NH₂ Metal-Organic Framework.

Peterson, Gregory W; Destefano, Matthew R; Garibay, Sergio J; Ploskonka, Ann; McEntee, Monica; Hall, Morgan; Karwacki, Christopher J; Hupp, Joseph T; Farha, Omar K.

Afiliação

Peterson GW; Edgewood Chemical Biological Center, 5183 Blackhawk Rd., Aberdeen Proving Ground, MD, 21010, USA.
Destefano MR; Department of Chemistry and the International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
Garibay SJ; Department of Chemistry and the International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
Ploskonka A; Leidos, Inc., PO Box 68, Gunpowder, MD, 21010, USA.
McEntee M; Edgewood Chemical Biological Center, 5183 Blackhawk Rd., Aberdeen Proving Ground, MD, 21010, USA.
Hall M; Edgewood Chemical Biological Center, 5183 Blackhawk Rd., Aberdeen Proving Ground, MD, 21010, USA.
Karwacki CJ; Edgewood Chemical Biological Center, 5183 Blackhawk Rd., Aberdeen Proving Ground, MD, 21010, USA.
Hupp JT; Department of Chemistry and the International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.
Farha OK; Department of Chemistry and the International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, IL, 60208, USA.