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Chemical Vapor Deposition Growth of Large Single-Crystal Mono-, Bi-, Tri-Layer Hexagonal Boron Nitride and Their Interlayer Stacking.
Ji, Yanxin; Calderon, Brian; Han, Yimo; Cueva, Paul; Jungwirth, Nicholas R; Alsalman, Hussain A; Hwang, Jeonghyun; Fuchs, Gregory D; Muller, David A; Spencer, Michael G.
Afiliação
  • Ji Y; School of Electrical and Computer Engineering, Cornell University , Ithaca, New York 14853, United States.
  • Calderon B; School of Electrical and Computer Engineering, Cornell University , Ithaca, New York 14853, United States.
  • Han Y; School of Applied and Engineering Physics, Cornell University , Ithaca, New York 14853, United States.
  • Cueva P; School of Applied and Engineering Physics, Cornell University , Ithaca, New York 14853, United States.
  • Jungwirth NR; School of Applied and Engineering Physics, Cornell University , Ithaca, New York 14853, United States.
  • Alsalman HA; School of Electrical and Computer Engineering, Cornell University , Ithaca, New York 14853, United States.
  • Hwang J; King Abdulaziz City for Science and Technology (KACST) , Riyadh, 6086-11442, Saudi Arabia.
  • Fuchs GD; School of Electrical and Computer Engineering, Cornell University , Ithaca, New York 14853, United States.
  • Muller DA; School of Applied and Engineering Physics, Cornell University , Ithaca, New York 14853, United States.
  • Spencer MG; School of Applied and Engineering Physics, Cornell University , Ithaca, New York 14853, United States.
ACS Nano ; 11(12): 12057-12066, 2017 12 26.
Article em En | MEDLINE | ID: mdl-29099576

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2017 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2017 Tipo de documento: Article