High-Performance and Industrially Feasible Ni-Rich Layered Cathode Materials by Integrating Coherent Interphase.

Min, Kyoungmin; Jung, Changhoon; Ko, Dong-Su; Kim, Kihong; Jang, Jaeduck; Park, Kwangjin; Cho, Eunseog.

Afiliação

Min K; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.
Jung C; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.
Ko DS; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.
Kim K; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.
Jang J; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.
Park K; Department of Mechanical Engineering , Gachon University , 1342 Seongnamdaero, Sujeong-gu , Seongnam-si , Gyeonggi-do 13120 , Republic of Korea.
Cho E; Platform Technology Lab , Samsung Advanced Institute of Technology , 130 Samsung-ro , Suwon , Gyeonggi-do 16678 , Republic of Korea.

ACS Appl Mater Interfaces ; 10(24): 20599-20610, 2018 Jun 20.

Article em En | MEDLINE | ID: mdl-29889496