Stacking Modes-Induced Chemical Reactivity Differences on Chemical Vapor Deposition-Grown Trilayer Graphene.

Ding, Yao; Wu, Ruizhe; Abidi, Irfan Haider; Wong, Hoilun; Liu, Zhenjing; Zhuang, Minghao; Gan, Li-Yong; Luo, Zhengtang.

Afiliação

Ding Y; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.
Wu R; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.
Abidi IH; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.
Wong H; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.
Liu Z; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.
Zhuang M; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.
Gan LY; School of Materials Science and Engineering, Key Laboratory of Advanced Energy Storage Materials of Guangdong Province , South China University of Technology , Guangzhou 510641 , P.R. China.
Luo Z; Department of Chemical and Biological Engineering , The Hong Kong University of Science and Technology , Clear Water Bay, Kowloon 999077 , Hong Kong.

ACS Appl Mater Interfaces ; 10(27): 23424-23431, 2018 Jul 11.

Article em En | MEDLINE | ID: mdl-29916694