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Effect of oxidation on intrinsic residual stress in amorphous silicon carbide films.
Deku, Felix; Mohammed, Shakil; Joshi-Imre, Alexandra; Maeng, Jimin; Danda, Vindhya; Gardner, Timothy J; Cogan, Stuart F.
Afiliação
  • Deku F; Department of Bioengineering, University of Texas at Dallas, Richardson, Texas.
  • Mohammed S; Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, Texas.
  • Joshi-Imre A; Department of Bioengineering, University of Texas at Dallas, Richardson, Texas.
  • Maeng J; Department of Bioengineering, University of Texas at Dallas, Richardson, Texas.
  • Danda V; Department of Bioengineering, University of Texas at Dallas, Richardson, Texas.
  • Gardner TJ; Department of Biology and Department of Biomedical Engineering, Boston University, Boston, Massachusetts.
  • Cogan SF; Department of Bioengineering, University of Texas at Dallas, Richardson, Texas.
J Biomed Mater Res B Appl Biomater ; 107(5): 1654-1661, 2019 07.
Article em En | MEDLINE | ID: mdl-30321479

Texto completo: 1 Base de dados: MEDLINE Assunto principal: Compostos de Silício / Compostos Inorgânicos de Carbono / Materiais Revestidos Biocompatíveis Idioma: En Ano de publicação: 2019 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Assunto principal: Compostos de Silício / Compostos Inorgânicos de Carbono / Materiais Revestidos Biocompatíveis Idioma: En Ano de publicação: 2019 Tipo de documento: Article