Grain-Boundary-Induced Alignment of Block Copolymer Thin Films.

Gottlieb, Steven; Fernández-Regúlez, Marta; Lorenzoni, Matteo; Evangelio, Laura; Perez-Murano, Francesc.

Afiliação

Gottlieb S; Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC), Bellaterra, 08193 Barcelona, Spain.
Fernández-Regúlez M; Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC), Bellaterra, 08193 Barcelona, Spain.
Lorenzoni M; Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC), Bellaterra, 08193 Barcelona, Spain.
Evangelio L; Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC), Bellaterra, 08193 Barcelona, Spain.
Perez-Murano F; Instituto de Microelectrónica de Barcelona (IMB-CNM, CSIC), Bellaterra, 08193 Barcelona, Spain.

Nanomaterials (Basel) ; 10(1)2020 Jan 04.

Article em En | MEDLINE | ID: mdl-31947950