Investigation of the growth of few-layer SnS<sub>2</sub> thin films via atomic layer deposition on an O<sub>2</sub> plasma-treated substrate.

Investigation of the growth of few-layer SnS₂ thin films via atomic layer deposition on an O₂ plasma-treated substrate.

Lee, Namgue; Choi, Hyeongsu; Park, Hyunwoo; Choi, Yeonsik; Yuk, Hyunwoo; Lee, JungHoon; Jeon, Hyeongtag.

Afiliação

Lee N; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul, Korea.
Choi H; Division of Materials Science and Engineering, Hanyang University, Seoul, Korea.
Park H; Division of Materials Science and Engineering, Hanyang University, Seoul, Korea.
Choi Y; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul, Korea.
Yuk H; Division of Materials Science and Engineering, Hanyang University, Seoul, Korea.
Lee J; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul, Korea.
Jeon H; Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul, Korea.

Nanotechnology ; 31(26): 265604, 2020 Apr 09.

Article em En | MEDLINE | ID: mdl-32176869

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article