An Improved Rosin Transfer Process for the Reduction of Residue Particles for Graphene.

Shahzad, Kashif; Jia, Kunpeng; Zhao, Chao; Yan, Xiangyu; Yadong, Zhang; Usman, Muhammad; Luo, Jun.

Afiliação

Shahzad K; Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029, People's Republic of China.
Jia K; School of Microelectronics, University of Chinese Academy of Sciences (UCAS), Beijing, 100049, People's Republic of China.
Zhao C; National Center for Physics, Quaid-i-Azam University, Islamabad, 46000, Pakistan.
Yan X; Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029, People's Republic of China. jiakunpeng@ime.ac.cn.
Yadong Z; Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029, People's Republic of China.
Usman M; School of Microelectronics, University of Chinese Academy of Sciences (UCAS), Beijing, 100049, People's Republic of China.
Luo J; Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Chaoyang District, Beijing, 100029, People's Republic of China.

Nanoscale Res Lett ; 15(1): 85, 2020 Apr 17.

Article em En | MEDLINE | ID: mdl-32303942