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DNA Origami Radiometers for Measuring Ultraviolet Exposure.
Fang, Weina; Xie, Mo; Hou, Xiaoling; Liu, Xiaoguo; Zuo, Xiaolei; Chao, Jie; Wang, Lianhui; Fan, Chunhai; Liu, Huajie; Wang, Lihua.
Afiliação
  • Fang W; School of Chemistry and Chemical Engineering, Frontiers Science Center for Transformative Molecules, and Shanghai Key Laboratory for Nucleic Acids Chemistry and Nanomedicine, Institute of Molecular Medicine, Renji Hospital, School of Medicine, Shanghai Jiao Tong University, Shanghai 200240, China.
  • Xie M; Key Laboratory for Organic Electronics & Information Dis-plays (KLOEID), Institute of Advanced Materials (IAM) and School of Materials Science and Engineering, Nanjing University of Posts & Telecommunications, Nanjing 210046, China.
  • Hou X; Division of Physical Biology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
  • Liu X; School of Chemistry and Chemical Engineering, Frontiers Science Center for Transformative Molecules, and Shanghai Key Laboratory for Nucleic Acids Chemistry and Nanomedicine, Institute of Molecular Medicine, Renji Hospital, School of Medicine, Shanghai Jiao Tong University, Shanghai 200240, China.
  • Zuo X; School of Chemistry and Chemical Engineering, Frontiers Science Center for Transformative Molecules, and Shanghai Key Laboratory for Nucleic Acids Chemistry and Nanomedicine, Institute of Molecular Medicine, Renji Hospital, School of Medicine, Shanghai Jiao Tong University, Shanghai 200240, China.
  • Chao J; Key Laboratory for Organic Electronics & Information Dis-plays (KLOEID), Institute of Advanced Materials (IAM) and School of Materials Science and Engineering, Nanjing University of Posts & Telecommunications, Nanjing 210046, China.
  • Wang L; Key Laboratory for Organic Electronics & Information Dis-plays (KLOEID), Institute of Advanced Materials (IAM) and School of Materials Science and Engineering, Nanjing University of Posts & Telecommunications, Nanjing 210046, China.
  • Fan C; School of Chemistry and Chemical Engineering, Frontiers Science Center for Transformative Molecules, and Shanghai Key Laboratory for Nucleic Acids Chemistry and Nanomedicine, Institute of Molecular Medicine, Renji Hospital, School of Medicine, Shanghai Jiao Tong University, Shanghai 200240, China.
  • Liu H; School of Chemical Science and Engineering, Shanghai Research Institute for Intelligent Autonomous Systems, Key Laboratory of Advanced Civil Engineering Materials of Ministry of Education, Tongji University, Shanghai 200092, China.
  • Wang L; Division of Physical Biology, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.
J Am Chem Soc ; 142(19): 8782-8789, 2020 05 13.
Article em En | MEDLINE | ID: mdl-32311267
ABSTRACT
Ultraviolet (UV) light has long been known to damage nucleic acids. In this work, a DNA origami radiometer has been developed for measuring UV exposure by monitoring the morphological evolution of DNA origami nanostructures. Unlike linear DNA strands that tend to be degraded into small segments upon UV exposure, the structural complexity and interstrand connectivity of DNA origami remarkably alter the pathway of UV-induced DNA damage. A general pathway of expansion, distortion, and final disintegration is observed for DNA origami regardless of their shape and size; however the deformation kinetics is positively correlated with the number of nicks in the nanostructure. This structural continuity-dependent deformation can be translated into a DNA-based radiometer for measuring UV dose in the environment.
Assuntos

Texto completo: 1 Base de dados: MEDLINE Assunto principal: Raios Ultravioleta / DNA / Nanoestruturas Idioma: En Ano de publicação: 2020 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Assunto principal: Raios Ultravioleta / DNA / Nanoestruturas Idioma: En Ano de publicação: 2020 Tipo de documento: Article