Variation on the Microstructure and Mechanical Properties of Ti-Al-N Films Induced by RF-ICP Ion Source Enhanced Reactive Nitrogen Plasma Atmosphere.

Li, Dongke; Xia, Lixia; Yan, Lian; Cao, Yunqing; Zhai, Zhangyin; Chen, Guibin.

Afiliação

Li D; Physics Department, Huaiyin Normal University, Huai'an, 223300, China. ldkest@nju.edu.cn.
Xia L; School of Electronic Science and Engineering, National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, Nanjing University, Nanjing, 210000, China. ldkest@nju.edu.c
Yan L; Physics Department, Huaiyin Normal University, Huai'an, 223300, China.
Cao Y; Huaiyin Normal University, Huai'an, 223300, China.
Zhai Z; School of Electronic Science and Engineering, National Laboratory of Solid State Microstructures, Collaborative Innovation Center of Advanced Microstructures, Jiangsu Provincial Key Laboratory of Advanced Photonic and Electronic Materials, Nanjing University, Nanjing, 210000, China.
Chen G; School of Physical Science and Technology, Yangzhou University, Yangzhou, 225000, China.

Nanoscale Res Lett ; 15(1): 119, 2020 May 24.

Article em En | MEDLINE | ID: mdl-32449078